nach der Bestellung gedruckt Neuware - Printed after ordering - The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development, and production. It provides the theoretical and practical background for applying these techniques in scientific and industrial materials characterization. The main aim of the book is to map the theoretical and practical background necessary to the study of single crystal materials by means of high-resolution x-ray diffraction and topography. It combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data.

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Bibliographic Details

Title: High Resolution X-Ray Diffractometry And Topography
Publisher: CRC Press
Publication Date: 1998
Language: English
ISBN 10: 0850667585
ISBN 13: 9780850667585
Binding: Buch
Condition: Neu
Dimensions: 240 millimeters width by 161 millimeters height by 19 millimeters depth
Weight: 564 grams

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Synopsis

The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development, and production. It provides the theoretical and practical background for applying these techniques in scientific and industrial materials characterization. The main aim of the book is to map the theoretical and practical background necessary to the study of single crystal materials by means of high-resolution x-ray diffraction and topography. It combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data.

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Bowen, D.K.; Tanner, Brian K.

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