High-k materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2-based dielectrics for future DRAM applications

Piotr Dudek

ISBN 10: 3838130189 / ISBN 13: 9783838130187

Published by S�dwestdeutscher Verlag f�r Hochschulschriften 2011-12-23, 2011

About this Item

Seller Inventory # 6666-IUK-9783838130187

Bibliographic Details

• Title: High-k materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2-based dielectrics for future DRAM applications
• Publisher: S�dwestdeutscher Verlag f�r Hochschulschriften 2011-12-23
• Publication Date: 2011
• Language: English
• ISBN 10: 3838130189
• ISBN 13: 9783838130187
• Binding: Paperback
• Condition: New

About this title

Synopsis

I would like to give you an outstanding opportunity to experience more about modern materials for Dynamic Random Access Memories. Therefore I give this book into your hands. You will find here a theory chapter focusing on DRAM physics as well as a deep description of deposition and characterization methods used in this work. Finally, you will discover how to engineer materials on an atomic scale and how to investigate those thin films.

About the Author

Born 1983 in Bogatynia,Poland.1992-1999 primary school in Bogatynia,1999-2002 secondary school in Bogatynia,2002-2007 Faculty of Microsystems, Electronics, Photonics, Wroclaw University of Technology,2004-2009 Faculty of Foreign Languages, Wroclaw University,2007-2011 BTU Cottbus Germany, PhD in experimental Physics