Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon

Language: English

Published by Springer Verlag GmbH, AT, 2012

3709172047 / 9783709172049

Series: Book 13 of 17 - Computational Microelectronics

  • Softcover
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Basically all properties of semiconductor devices are influenced by the distribution of point defects in their active areas. This book contains the first comprehensive review of the properties of intrinsic point defects, acceptor and donor impurities, isovalent atoms, chalcogens, and halogens in silicon, as well as of their complexes. Special emphasis is placed on compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behavior from experimental and theoretical investigations. In addition, the book discusses the fundamental concepts of silicon and its defects, the electron system, diffusion, thermodynamics, and reaction kinetics which form the scientific basis needed for a thorough understanding of the text. Therefore, the book is able to provide an introduction to newcomers in this field up to a comprehensive reference for experts in process technology, solid-state physics, and simulation of semiconductor processes. Softcover reprint of the original 1st ed. 2004. …

Seller Inventory # LU-9783709172049

Title
Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon
Author
Peter Pichler
Publisher
Springer Verlag GmbH, AT
Publication year
2012
Condition
New
Binding
Paperback
Language
English
ISBN 10
3709172047
ISBN 13
9783709172049
Series
Book 13 of 17: Computational Microelectronics

Rarewaves.com UK

London, United Kingdom

5-star seller

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