Diagnose and correct optical aberrations with rigorous theoretical depth
Aberrations in optical systems distort images and degrade instrument performance, yet thorough analytical treatment of these imperfections remains scarce. Lens Design for Imaging: Volume 2: Aberration Theory provides a detailed examination of primary and higher-order aberrations, authored by Herbert Gross, who draws on 30 years of optical system design at Carl Zeiss AG and 12 years of academic research at the University of Jena.
The volume covers aberration expansion, wave aberrations, astigmatism, parabasal pencils, and vectorial aberration theory ― topics not commonly consolidated in a single reference. It also addresses pupil aberrations, sine conditions, and aberrations of special components, equipping readers with the analytical tools required to diagnose optical imperfections and systematically improve system performance in high-precision design applications.
Key topics include:
- Primary and higher-order aberration analysis with detailed mathematical treatment for systematic classification and correction of optical imperfections
- Vectorial aberration theory providing advanced frameworks for modeling off-axis and non-rotationally symmetric optical system configurations
- Wave aberration formalism connecting wavefront deviations to image quality metrics used in precision optical engineering and tolerancing
- Pupil aberrations and sine conditions essential for understanding vignetting, telecentricity, and field-dependent performance across optical designs
- Aberrations of special components addressing unique correction challenges encountered in non-standard elements and configurations
Lens Design for Imaging: Volume 2: Aberration Theory serves physicists, optical engineers, and researchers in the optical industry who require a rigorous analytical framework for understanding and correcting aberrations. It provides the theoretical depth needed to advance high-precision optical system design and performance optimization.
Herbert Gross has 30 years’ experience designing optical systems at Zeiss AG and has spent 12 years teaching and conducting research at the University of Jena, Germany. His unique background spans both industrial lens design and academic research, providing him with deep insights into both the theoretical foundations and practical challenges of optical system development.
