Materials Processing Using Plasma Focus : Plasma Characterization and Processing of Industrial Materials

Language: English

Published by VDM Verlag Dr. Müller, 2010

3639276639 / 9783639276633

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Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH

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nach der Bestellung gedruckt Neuware - Printed after ordering - The present research work reports the parametric study of ion beams emitted from two different Mather type plasma focus devices and their utilization in materials processing. Experiments have been conducted by using a conventional 2.3 kJ UNU/ICTP plasma focus device and the NX2 device (a repetitive plasma focus). The ion parameters such as energy, energy distribution, number density and current density are evaluated in the ambient gas pressure by employing a BPX65 photodiode and a Faraday cup (FC) using time of flight technique. A major motivation is to establish the optimum processing conditions for ion nitriding, surface modification, phase changes and carburizing of materials of industrial interest like Ti, AlFe1.8Zn0.8 alloy and SS-321 in plasma environment. The processed samples are characterized for structural and morphological changes, compositional profile and surface hardness by employing XRD, SEM FESEM, EDX, XPS, Raman spectroscopy and Vickers microhardness test. The SRIM code and microindentation measurements are used to estimate the depth profile of the modified layers. …

Seller Inventory # 9783639276633

Title
Materials Processing Using Plasma Focus : Plasma Characterization and Processing of Industrial Materials
Author
Muhammad Hassan
Publisher
VDM Verlag Dr. Müller
Publication year
2010
Condition
Neu
Binding
Taschenbuch
Language
English
ISBN 10
3639276639
ISBN 13
9783639276633
Item weight
241 grams
Dimensions
220x150x10 mm

AHA-BUCH GmbH

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