Micro-electronic Processes for VLSI Fabrication

Debasis Mukherjee

ISBN 10: 6206753204 / ISBN 13: 9786206753209

Published by LAP LAMBERT Academic Publishing Jul 2023, 2023

About this Item

Neuware -'Micro-electronic Processes for VLSI Fabrication' is a comprehensive and authoritative guide that delves into the fundamental principles and advanced techniques used in the fabrication of Very Large Scale Integrated (VLSI) circuits. Covering a wide array of topics, the book begins with an in-depth introduction to Silicon Semiconductor Technology, including an overview of semiconductor materials, the crystal structure of silicon, intrinsic and extrinsic semiconductors, and the intricacies of doping and carrier concentration. Subsequent chapters delve into crucial aspects of VLSI fabrication, exploring wafer processing techniques, such as growth, preparation, defect inspection, and various wafer cleaning methods. The critical process of oxidation is covered in detail, explaining thermal, dry, and wet oxidation techniques along with oxide growth models.The book extensively examines epitaxial deposition methods, including Chemical Vapor Deposition (CVD), Molecular Beam Epitaxy (MBE), and selective epitaxy. Ion implantation and diffusion, pivotal processes for semiconductor device fabrication, are also meticulously discussed, with insights into ion implantation processes.Books on Demand GmbH, Überseering 33, 22297 Hamburg 204 pp. Englisch.

Seller Inventory # 9786206753209

Bibliographic Details

• Title: Micro-electronic Processes for VLSI Fabrication
• Publisher: LAP LAMBERT Academic Publishing Jul 2023
• Publication Date: 2023
• Language: English
• ISBN 10: 6206753204
• ISBN 13: 9786206753209
• Binding: Taschenbuch
• Condition: Neu
• Dimensions: 220W x 150H x 13D millimeters 220 millimeters width by 150 millimeters height by 13 millimeters depth
• Weight: 322 grams

About this title

Synopsis

"Micro-electronic Processes for VLSI Fabrication" is a comprehensive and authoritative guide that delves into the fundamental principles and advanced techniques used in the fabrication of Very Large Scale Integrated (VLSI) circuits. Covering a wide array of topics, the book begins with an in-depth introduction to Silicon Semiconductor Technology, including an overview of semiconductor materials, the crystal structure of silicon, intrinsic and extrinsic semiconductors, and the intricacies of doping and carrier concentration. Subsequent chapters delve into crucial aspects of VLSI fabrication, exploring wafer processing techniques, such as growth, preparation, defect inspection, and various wafer cleaning methods. The critical process of oxidation is covered in detail, explaining thermal, dry, and wet oxidation techniques along with oxide growth models.The book extensively examines epitaxial deposition methods, including Chemical Vapor Deposition (CVD), Molecular Beam Epitaxy (MBE), and selective epitaxy. Ion implantation and diffusion, pivotal processes for semiconductor device fabrication, are also meticulously discussed, with insights into ion implantation processes.