Nanoimprint Lithography: Principles, Processes and Materials (Nanotechnology Science and Technology)

Lan, Hongbo, Ding, Yucheng, Liu, Hongzhong

ISBN 10: 1611225019 / ISBN 13: 9781611225013

Published by Nova Science Pub Inc, 2011

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Bibliographic Details

• Title: Nanoimprint Lithography: Principles, Processes and Materials (Nanotechnology Science and Technology)
• Publisher: Nova Science Pub Inc
• Publication Date: 2011
• Language: English
• ISBN 10: 1611225019
• ISBN 13: 9781611225013
• Binding: paperback
• Condition: New
• Book Type: book

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Synopsis

Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.