Optical Lithography. This item is unavailable.Optical Lithography

This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author’s unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.

Burn J. Lin is a Distinguished Research Chair Professor at the National Tsing Hua University in Taiwan and the Director of the Tsing Hua-TSMC Joint Research Center. From 2011 to 2015 he was Vice President and a Distinguished Fellow at TSMC, Ltd., which he joined in 2000 as a Senior Director. Earlier he held various technical and managerial positions at IBM in the U.S., after joining the IBM T.J. Watson Research Center in 1970. He has been extending the limit of optical lithography for half a century. In 1991, he founded Linnovation, Inc. and is still the CEO of the company. Dr. Lin is the inaugurating Editor in Chief of the Journal of Micro/ Nanolithography, MEMS, and MOEMS, a life member of the U.S. National Academy of Engineering, Academician of Academia Sinica, Laureate of the Industrial Technology Research Institute in Taiwan, IEEE and SPIE Life Fellow, and a joint distinguished professor at the National Chiao Tung University and the National Taiwan University. He is also Distinguished Alumni of the Ohio State University and the National Taiwan University. Dr. Lin is the recipient of the 2018 Future Science Prize in Mathematics and Computer Science, a 2017 SPIE Award for inaugurating the Optical Microlithography Conference in 1987, the 2013 IEEE Jun-Ichi Nishizawa Medal, the first Semi IC Outstanding Achievement Award in 2010, the 2009 IEEE Cledo Brunetti Award, the 2009 Benjamin G. Lamme Meritorious Achievement Medal, the 2007 Industrial Technology Advancement Award, the 2006 Distinguished Optical Engineering Award from the Optical Engineering Society of R.O.C., the 2005 Most Valuable Player in VLSI Research Inc.’s All-Stars of the Chip Making Industry, the 2005 Two Best R&D Managers in Taiwan, the 2004 Outstanding Research Award from PWY Foundation, the first SPIE Fritz Zernike Award in 2004, the 2003 Outstanding Scientific and Technological Worker Award, and the 2002 Ten Best Engineers in Taiwan award. Throughout his career, he has received 2 TSMC Innovation Awards, 10 IBM Invention Awards, and an IBM Outstanding Technical Contribution Award. Dr. Lin has been pioneering deep-UV lithography since 1975, multilayer resist systems since 1979, simulation of 2D partially coherent imaging since 1980, exposure-defocus methodology since 1980, scaling equations of resolution and depth of focus since 1986, k1 reduction since 1987, proofs of 1X mask limitations since 1987, vibration in optical imaging since 1989, electrical measurement of contact holes since 1989, E-G tree for x-ray proximity printing since 1990, experimental demonstration of the impact of mask reflectivity on imaging since 1990, optimum lens NA since 1990, attenuated phase-shifting mask since 1991, signamization since 1996, LWD-h and LWD-b since 1999, nonparaxial scaling equations of resolution and depth of focus since 2000, 193-nm immersion lithography since 2002, and polarization-induced stray light since 2004. His innovations and research efforts have spanned 21 lithography generations, starting at the 5000-nm node and extending to the 5-nm node. Dr. Lin has written 2 books, 3 book chapters, and more than 132 articles, 71 of which he is the sole or the first author. He also holds 88 U.S. patents.