PATENT LAW IN GREATER CHINA.
Language: English
Published by SP EDWARD ELGAR, 2014
- Hardcover
- New

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Brand New! Fast Delivery This is an International Edition and ship within 24-48 hours. Deliver by FedEx and Dhl, & Aramex, UPS, & USPS and we do accept APO and PO BOX Addresses. Order can be delivered worldwide within 6-10 days and we do have flat rate for up to 2LB. Extra shipping charges will be requested if the Book weight is more than 5 LB. This Item May be shipped from India, United states & United Kingdom. Depending on your location and availability.
Seller Inventory # CbS 9781781954836
- Title
- PATENT LAW IN GREATER CHINA.
- Author
- MISC
- Publisher
- SP EDWARD ELGAR
- Publication year
- 2014
- Condition
- New
- Binding
- Hardcover
- Language
- English
- ISBN 10
- 1781954836
- ISBN 13
- 9781781954836
- Edition
- 2nd Edition, International Edition
Features:
- Introduction to Chinese patent policy.
- Detailed coverage of technology transfer and substantive patent law in China, including prerequisites for protection, exceptions and limitations.
- Practical analysis of patent law relating to 3 specific fields of invention: employee inventions, biotechnological and pharmaceutical inventions, and software inventions.
- Overview of the patent application and examination procedure, with a particular view on PCT applications.
- Insight into specific characteristics of enforcement mechanisms and jurisprudence in China, including the dual enforcement system, claim interpretation, infringement types, and invalidity procedures.
- Invaluable section on the relationship between patent and antitrust law, including practical realities in the sphere of anticompetitive licensing.
- Overviews of the patent systems of Chinese Taipei, Hong Kong SAR and Macau SAR
- Edited by two leading patent experts, and written by a team of experienced practitioners from China and from Europe, offering insight rarely brought together in a single place.
This book will be an indispensable reference work for lawyers, patent attorneys and other practitioners interested in learning whether and how to protect patents in China.
Contributors: C. Bailey, Y. Bu, J. Cao, W. Chen, D. Clark, G. Cui, C. Czychowski, M. Deng, P. Ganea, H. Goddar, N. Heide, S.-H. Lee, J. Li, Y. Li, K.-C. Liu, S. Luginbuehl, Q. Ma, T. Mak, J.B. Nordemann, T. Pattloch, O. Pfaffenzeller, B. Roth, C.D. Simões, L. Wang, B. Weibel
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