Pattern Analysis And Machine Intelligence: Second International Conference, Icpami 2025, Dalian, China, October 31 - November 2, 2025, Revised Selected Papers

Yang, Jie (Editor)/ He, Ran (Editor)/ Ma, Shiwei (Editor)

ISBN 10: 981959524X / ISBN 13: 9789819595242

Published by Springer Verlag, Singapore, 2026

About this Item

245 pages. 6.10x0.56x9.25 inches. In Stock.

Seller Inventory # x-981959524X

Bibliographic Details

• Title: Pattern Analysis And Machine Intelligence: Second International Conference, Icpami 2025, Dalian, China, October 31 - November 2, 2025, Revised Selected Papers
• Publisher: Springer Verlag, Singapore
• Publication Date: 2026
• Language: English
• ISBN 10: 981959524X
• ISBN 13: 9789819595242
• Binding: Paperback
• Condition: Brand New
• Weight: 0.37 kilograms

About this title

Synopsis

This book constitutes the referred proceedings of the Second International Conference on Pattern Analysis and Machine Intelligence, ICPAMI 2025, held in Dalian, China, during August 29–31, 2025.

The 23 papers presented here were carefully reviewed and selected from 51 submissions. Their insightful talks covered the applications, challenges, and future directions of Multimodal Foundation and Large Language Models, the frontiers and perspectives in 3D Spatial Video Reconstruction, and research on defenses and out-of-distribution detection in trustworthy deep learning.