Polycrystalline Silicon for Integrated Circuit Applications

Ted Kamins

ISBN 10: 1461289491 / ISBN 13: 9781461289494

Published by Springer, Springer, 2011

About this Item

Druck auf Anfrage Neuware - Printed after ordering - Recent years have seen silicon integrated circuits enter into an increasing number of technical and consumer applications, until they now affect everyday life, as well as technical areas. Polycrystalline silicon has been an important component of silicon technology for nearly two decades, being used first in MOS integrated circuits and now becoming pervasive in bipolar circuits, as well. During this time a great deal of informa tion has been published about polysilicon. A wide range of deposition conditions has been used to form films exhibiting markedly different properties. Seemingly contradictory results can often be explained by considering the details of the structure formed. This monograph is an attempt to synthesize much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon so that it can be used most effectively to enhance device and integrated-circuit perfor mance. As device performance improves, however, some of the proper ties of polysilicon are beginning to restrict the overall performance of integrated circuits, and the basic limitations of the properties of polysili con also need to be better understood to minimize potential degradation of circuit behavior.

Seller Inventory # 9781461289494

Bibliographic Details

• Title: Polycrystalline Silicon for Integrated Circuit Applications
• Publisher: Springer, Springer
• Publication Date: 2011
• Language: English
• ISBN 10: 1461289491
• ISBN 13: 9781461289494
• Binding: Taschenbuch
• Condition: Neu
• Dimensions: 235W x 155H x 17D millimeters 235 millimeters width by 155 millimeters height by 17 millimeters depth
• Weight: 470 grams

About this title

Synopsis

Recent years have seen silicon integrated circuits enter into an increasing number of technical and consumer applications, until they now affect everyday life, as well as technical areas. Polycrystalline silicon has been an important component of silicon technology for nearly two decades, being used first in MOS integrated circuits and now becoming pervasive in bipolar circuits, as well. During this time a great deal of informa­ tion has been published about polysilicon. A wide range of deposition conditions has been used to form films exhibiting markedly different properties. Seemingly contradictory results can often be explained by considering the details of the structure formed. This monograph is an attempt to synthesize much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon so that it can be used most effectively to enhance device and integrated-circuit perfor­ mance. As device performance improves, however, some of the proper­ ties of polysilicon are beginning to restrict the overall performance of integrated circuits, and the basic limitations of the properties of polysili­ con also need to be better understood to minimize potential degradation of circuit behavior.