Principles of Plasma Discharges and Materials Processing

Lieberman, Michael A.; Lichtenberg, Allan J.

ISBN 10: 0471005770 / ISBN 13: 9780471005773

Published by Wiley-Interscience, 1994

About this Item

Light cover wear, book is stamped inside cover, otherwise very good condition, text is unmarked.

Seller Inventory # 251029013

Bibliographic Details

• Title: Principles of Plasma Discharges and Materials Processing
• Publisher: Wiley-Interscience
• Publication Date: 1994
• Language: English
• ISBN 10: 0471005770
• ISBN 13: 9780471005773
• Binding: hardcover
• Condition: Good
• Weight: 36 ounces

About this title

Synopsis

Timely, authoritative, pedagogically consistent— a valuable professional resource and a superior didactic tool. Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications—especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.

• In-depth coverage of the fundamentals of plasma physics and chemistry—includes separate chapters on atomic and molecular collisions
• Applies basic theory to plasma discharges, including calculations of plasma parameters and scaling of plasma parameters with control parameters
• Applies results to basic processing mechanisms and the effects of plasma parameters on those mechanisms
• Uses numerous worked examples to demonstrate the relationships between control parameters, plasma parameters, and processing results

About the Author

MICHAEL A. LIEBERMAN, PhD, is Professor of Electrical Engineering at the University of California, Berkeley, and Director of the Berkeley Electronics Research Laboratory. He has published more than 140 journal articles on the topics of plasmas, plasma processing, and nonlinear dynamics. He has also published, with Professor Lichtenberg, Regular and Stochastic Motion and Regular and Chaotic Dynamics, Second Edition. ALLAN J. LICHTENBERG, PhD, is Professor of Electrical Engineering at the University of California, Berkeley. A respected pioneer in the fields of high-temperature plasmas, plasma discharges, and nonlinear dynamics, Dr. Lichtenberg has written over 100 articles in these areas. In addition to the books coauthored with Professor Lieberman, he has written an earlier monograph Phase Space Dynamics of Particles.