Principles and Practice of Thin-Film Deposition (Paperback)
Language: English
Published by Independently Published, 2026
- Softcover
- New

Seller: Grand Eagle Retail, Bensenville, IL, U.S.A.Grand Eagle Retail
AbeBooks seller since October 12, 2005
Condition: New
US$ 159.99
Quantity: 1 available
Add to basketItem description from seller
Paperback. How do atomic-scale surface reactions become reliable, high-performance coatings used in semiconductor devices, energy systems, optics, and advanced manufacturing?Principles and Practice of Thin-Film Deposition provides a rigorous, application-focused guide to the science and engineering behind modern coating and layer-growth methods. Designed for graduate students, researchers, materials scientists, process engineers, and technical professionals, it connects fundamental physics and chemistry with the equipment, controls, diagnostics, and manufacturing decisions that determine real-world results.Beginning with vacuum science, gas kinetics, thermodynamics, nucleation, growth modes, microstructure, defects, stress, adhesion, and contamination control, the book builds the foundation required to understand why deposited layers behave as they do. It then examines thermal evaporation, DC and RF magnetron sputtering, reactive sputtering, HiPIMS, ion-assisted methods, pulsed laser deposition, chemical vapor deposition, plasma-enhanced CVD, metalorganic CVD, low-pressure CVD, atomic layer deposition, molecular beam epitaxy, and silicon epitaxy.Inside, you will learn to: - Relate pressure, temperature, flow, power, bias, geometry, and surface chemistry to thickness, composition, texture, density, stress, and uniformity.- Compare major deposition platforms and select suitable methods for metals, dielectrics, semiconductors, optical stacks, barriers, hard coatings, and conformal three-dimensional structures.- Understand reactor designs, vacuum pumps, gauges, precursor delivery systems, plasma behavior, target erosion, target poisoning, and process-safety requirements.- Apply structural, chemical, electrical, mechanical, and optical characterization methods, including XRD, XRR, SEM, TEM, AFM, XPS, SIMS, ellipsometry, Hall measurement, nanoindentation, and wafer-curvature analysis.- Use design of experiments, statistical process control, process-window development, yield modeling, simulation, and qualification strategies to improve repeatability and scale-up.- Explore applications in CMOS fabrication, advanced memory, photovoltaics, solid-state batteries, optical coatings, MEMS, photonics, flexible electronics, and surface engineering.Supported by quantitative explanations, technical diagrams, key equations, reference tables, a glossary, and process-selection appendices, this textbook gives you the framework needed to analyze, develop, troubleshoot, and optimize deposition processes with greater confidence. This item is printed on demand. Shipping may be from multiple locations in the US or from the UK, depending on stock availability.…
Seller Inventory # 9798186673842
- Title
- Principles and Practice of Thin-Film Deposition (Paperback)
- Author
- Marcus T. Eberhardt
- Publisher
- Independently Published
- Publication year
- 2026
- Condition
- new
- Binding
- Paperback
- Language
- English
- ISBN 13
- 9798186673842
Principles and Practice of Thin-Film Deposition provides a rigorous, application-focused guide to the science and engineering behind modern coating and layer-growth methods. Designed for graduate students, researchers, materials scientists, process engineers, and technical professionals, it connects fundamental physics and chemistry with the equipment, controls, diagnostics, and manufacturing decisions that determine real-world results.
Beginning with vacuum science, gas kinetics, thermodynamics, nucleation, growth modes, microstructure, defects, stress, adhesion, and contamination control, the book builds the foundation required to understand why deposited layers behave as they do. It then examines thermal evaporation, DC and RF magnetron sputtering, reactive sputtering, HiPIMS, ion-assisted methods, pulsed laser deposition, chemical vapor deposition, plasma-enhanced CVD, metalorganic CVD, low-pressure CVD, atomic layer deposition, molecular beam epitaxy, and silicon epitaxy.
Inside, you will learn to:
• Relate pressure, temperature, flow, power, bias, geometry, and surface chemistry to thickness, composition, texture, density, stress, and uniformity.
• Compare major deposition platforms and select suitable methods for metals, dielectrics, semiconductors, optical stacks, barriers, hard coatings, and conformal three-dimensional structures.
• Understand reactor designs, vacuum pumps, gauges, precursor delivery systems, plasma behavior, target erosion, target poisoning, and process-safety requirements.
• Apply structural, chemical, electrical, mechanical, and optical characterization methods, including XRD, XRR, SEM, TEM, AFM, XPS, SIMS, ellipsometry, Hall measurement, nanoindentation, and wafer-curvature analysis.
• Use design of experiments, statistical process control, process-window development, yield modeling, simulation, and qualification strategies to improve repeatability and scale-up.
• Explore applications in CMOS fabrication, advanced memory, photovoltaics, solid-state batteries, optical coatings, MEMS, photonics, flexible electronics, and surface engineering.
Supported by quantitative explanations, technical diagrams, key equations, reference tables, a glossary, and process-selection appendices, this textbook gives you the framework needed to analyze, develop, troubleshoot, and optimize deposition processes with greater confidence.
"Synopsis" may belong to another edition of this title.
Grand Eagle Retail
Bensenville, IL, U.S.A.
AbeBooks seller since October 12, 2005
Shipping rates within U.S.A.
| Item | 6 to 14 business days | 6 to 16 business days |
|---|---|---|
| First item | US$ 0.00 | US$ 0.00 |
Payment methods
Seller's business information
APOLLO ONLINE CORP.
605 Geddes Street
Wilmington, DE U.S.A. 19805
Terms of sale
We guarantee the condition of every book as it¿s described on the Abebooks web sites. If you¿ve changed
your mind about a book that you¿ve ordered, please use the Ask bookseller a question link to contact us
and we¿ll respond within 2 business days.
Books ship from California and Michigan.
Shipping terms
Orders usually ship within 2 business days. All books within the US ship free of charge. Delivery is 4-14 business days anywhere in the United States.
Books ship from California and Michigan.
If your book order is heavy or oversized, we may contact you to let you know extra shipping is required.