Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47)

Alfred Kwok-Kit Wong

ISBN 10: 0819439959 / ISBN 13: 9780819439956

Published by SPIE Publications, 2001

About this Item

Wraps are firm, text block clean, without highlights/underlining or markings. Some rubbing/curling to wraps. Very clean, very nice example. Well packaged and promptly shipped from California. Partnered with Friends of the Library since 2010.

Seller Inventory # BAY_16_SH_080702

Bibliographic Details

• Title: Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47)
• Publisher: SPIE Publications
• Publication Date: 2001
• Language: English
• ISBN 10: 0819439959
• ISBN 13: 9780819439956
• Binding: Soft cover
• Condition: Very Good

About this title

Synopsis

This tutorial summarizes optical lithography enhancement research and development over the past 20 years. Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.

Contents

- Foreword
- Preface
- List of symbols
- Introduction
- Optical imaging and resolution
- Modified illumination
- Optical proximity correction
- Alternating phase-shifting mask
- Attenuated phase-shift mask
- Selecting appropriate RETs
- Second-generation RETs
- Concluding remarks
- k1 conversion charts
- Bibliography
- Index