Scanning Electron Microscopy, X-Ray Microanalysis, and Analytical Electron Microscopy: A Laboratory Workbook
Lyman, Charles E.; Newbury, Dale E.; Goldstein, Joseph; Williams, David B.; Romig Jr., Alton D.; Armstrong, John; Echlin, Patrick; Fiori, Charles; Joy, David C.; Lifshin, Eric; Peters, Klaus-Rüdiger
Language: English
Published by Springer, 1990
- Softcover
- New

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- Title
- Scanning Electron Microscopy, X-Ray Microanalysis, and Analytical Electron Microscopy: A Laboratory Workbook
- Author
- Lyman, Charles E.; Newbury, Dale E.; Goldstein, Joseph; Williams, David B.; Romig Jr., Alton D.; Armstrong, John; Echlin, Patrick; Fiori, Charles; Joy, David C.; Lifshin, Eric; Peters, Klaus-Rüdiger
- Publisher
- Springer
- Publication year
- 1990
- Condition
- New
- Binding
- paperback
- Language
- English
- ISBN 10
- 0306435918
- ISBN 13
- 9780306435911
- Item weight
- 26 ounces
- Dimensions
- 7x0x9
"Synopsis" may belong to another edition of this title.
From the Back Cover
With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal.
- Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers
- Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results
- Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements
- Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.
- Includes case studies to illustrate practical problem solving
- Covers Helium ion scanning microscopy
- Organized into relatively self-contained modules – no need to "read it all" to understand a topic
- Includes an online supplement―an extensive "Database of Electronic–Solid Interactions"―which can be accessed on SpringerLink, in Chapter 3
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