A basic introduction to the physical properties of semiconductor devices and fabrication technology, this work presents the theoretical and practical aspects of every step in device fabrication, with an emphasis on integrated circuits. Divided into three parts, it covers the basic properties of semiconductors and processes, emphasizing silicon and gallium arsenide; the physics and characteristics of semiconductor devices, bipolar and unipolar devices, and special microwave and photonic devices; and the latest processing technologies, from crystal growth to lithographic pattern transfer.

From the Back Cover

This eagerly-anticipated revision offers more than 50% new or revised material that reflects the multitude of important recent discoveries and advances in device physics and integrated circuit processing.

The book offers a thorough introduction to physical principles of modern semiconductor devices and their fabrication technology. Readers are presented with theoretical and practical aspects of every step in device characterizations and fabrication, with an emphasis on integrated circuits.

The material is divided into three parts:

the basic properties of semiconductor materials, emphasizing silicon and gallium arsenide
the physics and characteristics of semiconductor device bipolar, unipolar special microwave and photonic devices
the latest processing technologies, from crystal growth to lithographic pattern transfer

Each chapter is presented in a logical manner enabling readers to learn all important devices from a single source. Plus, the book covers historical developments of devices and technology in the last 100 years. Readers gain a sound perspective on the past and a foundation for projecting future trends.

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