Gain insight into how measurement science drives silicon device processing.
This proceedings volume captures a 1970 symposium focused on the measurement field in silicon device research and manufacturing.
Designed for applied scientists and engineers, it emphasizes diffusion, epitaxy, surface preparation, and the interdependence of processing steps. The collection highlights current techniques, practical evaluation methods, and the emergence of new measurement approaches to improve device quality and reliability.
- Comprehensive discussions on diffusion, epitaxy, and surface preparation for silicon devices
- Analysis of how measurement techniques validate and guide processing decisions
- Profiles of equipment, methodologies, and practical working knowledge for labs and fabs
- Context for evolving standards in device production and materials characterization
Ideal for readers involved in silicon device processing, materials science, and semiconductor measurement practices.