Simulation of Semiconductor Processes and Devices 2001 : SISPAD 01

Christos Tsamis

ISBN 10: 3709172780 / ISBN 13: 9783709172780

Published by Springer Vienna, Springer Vienna, 2012

About this Item

Druck auf Anfrage Neuware - Printed after ordering - This volume contains the Proceedings of the International Conference on Simulation of Semiconductor Devices and Processes, SISPAD 01, held on September 5-7, 2001, in Athens.The conference provided an open forum for the presentation of the latest results and trends in process and device simulation. The trend towards shrinking device dimensions and increasing complexity in process technology demands the continuous development of advanced models describing basic physical phenomena involved. New simulation tools are developed to complete the hierarchy in the Technology Computer Aided Design simulation chain between microscopic and macroscopic approaches. The conference program featured 8 invited papers, 60 papers for oral presentation and 34 papers for poster presentation, selected from a total of 165 abstracts from 30 countries around the world. These papers disclose new and interesting concepts for simulating processes and devices.

Seller Inventory # 9783709172780

Bibliographic Details

• Title: Simulation of Semiconductor Processes and Devices 2001 : SISPAD 01
• Publisher: Springer Vienna, Springer Vienna
• Publication Date: 2012
• Language: English
• ISBN 10: 3709172780
• ISBN 13: 9783709172780
• Binding: Taschenbuch
• Condition: Neu
• Dimensions: 235W x 155H x 26D millimeters 235 millimeters width by 155 millimeters height by 26 millimeters depth
• Weight: 715 grams

About this title

Synopsis

This volume contains the Proceedings of the International Conference on Simulation of Semiconductor Devices and Processes, SISPAD 01, held on September 5–7, 2001, in Athens. The conference provided an open forum for the presentation of the latest results and trends in process and device simulation. The trend towards shrinking device dimensions and increasing complexity in process technology demands the continuous development of advanced models describing basic physical phenomena involved. New simulation tools are developed to complete the hierarchy in the Technology Computer Aided Design simulation chain between microscopic and macroscopic approaches. The conference program featured 8 invited papers, 60 papers for oral presentation and 34 papers for poster presentation, selected from a total of 165 abstracts from 30 countries around the world. These papers disclose new and interesting concepts for simulating processes and devices.