Site Characterization and Aggregation of Implanted Atoms in Materials

Language: English

Published by Springer US, Chapman And Hall/CRC, 2012

1468410172 / 9781468410174

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Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH

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Druck auf Anfrage Neuware - Printed after ordering - Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.

Seller Inventory # 9781468410174

Title
Site Characterization and Aggregation of Implanted Atoms in Materials
Author
R. Coussement
Publisher
Springer US, Chapman And Hall/CRC
Publication year
2012
Condition
Neu
Binding
Taschenbuch
Language
English
ISBN 10
1468410172
ISBN 13
9781468410174
Item weight
914 grams
Dimensions
244x170x29 mm

AHA-BUCH GmbH

Einbeck, Germany

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AbeBooks seller since August 14, 2006

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