Site Characterization and Aggregation of Implanted Atoms in Materials

R. Coussement

ISBN 10: 1468410172 / ISBN 13: 9781468410174

Published by Springer US, Chapman And Hall/CRC Mär 2012, 2012

About this Item

This item is printed on demand - it takes 3-4 days longer - Neuware -Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products. 536 pp. Englisch.

Seller Inventory # 9781468410174

Bibliographic Details

• Title: Site Characterization and Aggregation of Implanted Atoms in Materials
• Publisher: Springer US, Chapman And Hall/CRC Mär 2012
• Publication Date: 2012
• Language: English
• ISBN 10: 1468410172
• ISBN 13: 9781468410174
• Binding: Taschenbuch
• Condition: Neu
• Dimensions: 244W x 170H x 29D millimeters 244 millimeters width by 170 millimeters height by 29 millimeters depth
• Weight: 914 grams

About this title

Synopsis

Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro­ posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under­ standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.