Title: Spacer Engineered FinFET Architectures High-Performance Digital Circuit Applications
Publisher: Taylor & Francis Group
Publication Date: 2017
Language: English
ISBN 10: 1498783597
ISBN 13: 9781498783590
Binding: Hardcover
Condition: New

About this title

Synopsis

This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.

About the Author

Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal

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