Study of the surface layer of silicon with indium coating

This work relates to the field of nanotechnology, which has been developing rapidly in recent decades. Many aspects remain unclear and require further study. The proposed work contains an analysis of the patterns of formation of reconstruction elements and cluster structures on Si(111) and Si(557) surfaces. The features of the emergence of 7x7 reconstruction on the vicinal surface of Si(557) are investigated. It has been established that, unlike on the Si(111) surface, the formation of clusters on the Si(557) surface does not begin immediately with the start of deposition. The delay is up to 20% of the total monolayer deposition time. During this delay, indium atoms are deposited on the steps, forming areas of unstructured indium coating. An attempt was made to explain the reason for the formation of such complex reconstructions as 7x7 or 5x5. A version of the STMS technique was formulated, which involves simultaneous scanning of the surface relief and removal of spectroscopic dependencies.