Updates in Advanced Lithography

Sumio Hosaka

ISBN 10: 9535111752 / ISBN 13: 9789535111757

Published by Intechopen Jul 2013, 2013

About this Item

This item is printed on demand - Print on Demand Titel. Neuware -Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.Books on Demand GmbH, Überseering 33, 22297 Hamburg 262 pp. Englisch.

Seller Inventory # 9789535111757

Bibliographic Details

• Title: Updates in Advanced Lithography
• Publisher: Intechopen Jul 2013
• Publication Date: 2013
• Language: English
• ISBN 10: 9535111752
• ISBN 13: 9789535111757
• Binding: Buch
• Condition: Neu
• Dimensions: 266W x 185H x 23D millimeters 266 millimeters width by 185 millimeters height by 23 millimeters depth
• Weight: 782 grams

About this title

Synopsis

Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.