A User's Guide to Vacuum Technology

O'Hanlon, John F.

ISBN 10: 0471812420 / ISBN 13: 9780471812425

Published by Wiley-Interscience, 1989

About this Item

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Bibliographic Details

• Title: A User's Guide to Vacuum Technology
• Publisher: Wiley-Interscience
• Publication Date: 1989
• Language: English
• ISBN 10: 0471812420
• ISBN 13: 9780471812425
• Binding: Hardcover
• Edition: 2nd Edition
• Condition: Acceptable

About this title

Synopsis

An introduction to the theory and practice of modern vacuum technology, with applications. Focuses on the understanding, operation, and selection of equipment for vacuum processes used in semiconductor, optical, and related technologies. This 2nd Edition has new information on components, lubrication, pump fluids, and other materials. Basic characteristics and operational procedures are given for each high-vacuum pumping system.

From the Back Cover

The leading text in the field–fully updated to reflect changes in vacuum technology

In the decade and a half since the publication of the Second Edition of A User’s Guide to Vacuum Technology there have been many important advances in the field, including spinning rotor gauges, dry mechanical pumps, magnetically levitated turbo pumps, and ultraclean system designs. These, along with improved cleaning and assembly techniques have made contamination-free manufacturing a reality. Designed to bridge the gap in both knowledge and training between designers and end users of vacuum equipment, the Third Edition offers a practical perspective on today’s vacuum technology. With a focus on the operation, understanding, and selection of equipment for industrial processes used in semiconductor, optics, packaging, and related coating technologies, A User’s Guide to Vacuum Technology, Third Edition provides a detailed treatment of this important field. While emphasizing the fundamentals and touching on significant topics not adequately covered elsewhere, the text avoids topics not relevant to the typical user.

The Third Edition features significant additions, including:

• Updated coverage of all topics
• A discussion of SI units and their conversion
• Expanded coverage of gauges, pumps, materials, components, and systems
• A discussion of ultraclean vacuum systems–now used routinely in high-volume production of semiconductor chips and related process-sensitive devices
• A review of rough pumping and crossover, including methods for prevention of aerosol formation

As with previous editions, the Third Edition is an important resource for both students and professionals in microelectronics, optics, thin-film coating, and other industries dependent on leading-edge applications of vacuum technology.