A User's Guide to Vacuum Technology
Language: English
Published by Wiley & Sons, Incorporated, John, 1989
- Hardcover
- Used

Seller: Better World Books: West, Reno, NV, U.S.A.Better World Books: West
AbeBooks seller since March 14, 2016
Condition: Used - Very good
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Add to basketItem description from seller
Pages intact with possible writing/highlighting. Binding strong with minor wear. Dust jackets/supplements may not be included. Stock photo provided. Product includes identifying sticker. Better World Books: Buy Books. Do Good.
Seller Inventory # 4115583-75
- Title
- A User's Guide to Vacuum Technology
- Author
- O'Hanlon, John F.
- Publisher
- Wiley & Sons, Incorporated, John
- Publication year
- 1989
- Condition
- Very Good
- Binding
- Hardcover
- Language
- English
- ISBN 10
- 0471812420
- ISBN 13
- 9780471812425
- Edition
- 2nd Edition
- Item weight
- 1.764 pounds
- Dimensions
- N/A
"Synopsis" may belong to another edition of this title.
From the Back Cover
In the decade and a half since the publication of the Second Edition of A User’s Guide to Vacuum Technology there have been many important advances in the field, including spinning rotor gauges, dry mechanical pumps, magnetically levitated turbo pumps, and ultraclean system designs. These, along with improved cleaning and assembly techniques have made contamination-free manufacturing a reality. Designed to bridge the gap in both knowledge and training between designers and end users of vacuum equipment, the Third Edition offers a practical perspective on today’s vacuum technology. With a focus on the operation, understanding, and selection of equipment for industrial processes used in semiconductor, optics, packaging, and related coating technologies, A User’s Guide to Vacuum Technology, Third Edition provides a detailed treatment of this important field. While emphasizing the fundamentals and touching on significant topics not adequately covered elsewhere, the text avoids topics not relevant to the typical user.
The Third Edition features significant additions, including:
- Updated coverage of all topics
- A discussion of SI units and their conversion
- Expanded coverage of gauges, pumps, materials, components, and systems
- A discussion of ultraclean vacuum systems–now used routinely in high-volume production of semiconductor chips and related process-sensitive devices
- A review of rough pumping and crossover, including methods for prevention of aerosol formation
As with previous editions, the Third Edition is an important resource for both students and professionals in microelectronics, optics, thin-film coating, and other industries dependent on leading-edge applications of vacuum technology.
"About the title" may belong to another edition of this title.
Better World Books: West
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