A User's Guide to Vacuum Technology
Language: English
Published by Wiley-Interscience, 1989
- Hardcover
- Used

Seller: Bay State Book Company, North Smithfield, RI, U.S.A.Bay State Book Company
AbeBooks seller since January 23, 2023
Condition: Used - Good
US$ 18.89
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Add to basketItem description from seller
The book is in good condition with all pages and cover intact, including the dust jacket if originally issued. The spine may show light wear. Pages may contain some notes or highlighting, and there might be a "From the library of" label. Boxed set packaging, shrink wrap, or included media like CDs may be missing.
Seller Inventory # BSM.1BXJ8
- Title
- A User's Guide to Vacuum Technology
- Author
- O'Hanlon, John F.
- Publisher
- Wiley-Interscience
- Publication year
- 1989
- Condition
- good
- Binding
- Hardcover
- Language
- English
- ISBN 10
- 0471812420
- ISBN 13
- 9780471812425
- Edition
- 2nd Edition
"Synopsis" may belong to another edition of this title.
From the Back Cover
In the decade and a half since the publication of the Second Edition of A User’s Guide to Vacuum Technology there have been many important advances in the field, including spinning rotor gauges, dry mechanical pumps, magnetically levitated turbo pumps, and ultraclean system designs. These, along with improved cleaning and assembly techniques have made contamination-free manufacturing a reality. Designed to bridge the gap in both knowledge and training between designers and end users of vacuum equipment, the Third Edition offers a practical perspective on today’s vacuum technology. With a focus on the operation, understanding, and selection of equipment for industrial processes used in semiconductor, optics, packaging, and related coating technologies, A User’s Guide to Vacuum Technology, Third Edition provides a detailed treatment of this important field. While emphasizing the fundamentals and touching on significant topics not adequately covered elsewhere, the text avoids topics not relevant to the typical user.
The Third Edition features significant additions, including:
- Updated coverage of all topics
- A discussion of SI units and their conversion
- Expanded coverage of gauges, pumps, materials, components, and systems
- A discussion of ultraclean vacuum systems–now used routinely in high-volume production of semiconductor chips and related process-sensitive devices
- A review of rough pumping and crossover, including methods for prevention of aerosol formation
As with previous editions, the Third Edition is an important resource for both students and professionals in microelectronics, optics, thin-film coating, and other industries dependent on leading-edge applications of vacuum technology.
"About the title" may belong to another edition of this title.
Bay State Book Company
North Smithfield, RI, U.S.A.
AbeBooks seller since January 23, 2023
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