VLSI Electronics Microstructure Science. Volume 8: Plasma Processing for VLSI.

Einspruch, Norman G. und Dale M. Brown:

ISBN 10: 0122341082 / ISBN 13: 9780122341083

Published by Orlando u.a., Academic Press,, 1984

About this Item

XVI, 527 S. mit Abb. Foliertes Bibliotheksexemplar. Mehrfach gestempelt. 71187 0122341082 Sprache: Deutsch Gewicht in Gramm: 1000.

Seller Inventory # 56445

Bibliographic Details

• Title: VLSI Electronics Microstructure Science. Volume 8: Plasma Processing for VLSI.
• Publisher: Orlando u.a., Academic Press,
• Publication Date: 1984
• Language: German
• ISBN 10: 0122341082
• ISBN 13: 9780122341083
• Binding: Groß 8°. O.Leinen.
• Weight: 1000 grams
• Seller catalogs:
  • Naturwissenschaften und Mathematik

About this title

Synopsis

VLSI Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.