Lattice Engineering Technology Applications (6 results)

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  • Language: English

    Published by Jenny Stanford Publishing, 2012

    9814316296 / 9789814316293

    • Hardcover

    Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices

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    US$ 158.24

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    Condition: As New. Unread book in perfect condition.

  • Language: English

    Published by Jenny Stanford Publishing, 2012

    9814316296 / 9789814316293

    • Hardcover

    Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices

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    US$ 167.39

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  • Language: English

    Published by Jenny Stanford Publishing, 2012

    9814316296 / 9789814316293

    • Hardcover

    Seller: GreatBookPricesUK, Woodford Green, United KingdomGreatBookPricesUK

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    Condition: Used - As new

    US$ 163.56

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  • Language: English

    Published by Pan Stanford Pub, 2012

    9814316296 / 9789814316293

    • Hardcover

    Seller: Revaluation Books, Exeter, United KingdomRevaluation Books

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    Condition: New

    US$ 184.87

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    Hardcover. Condition: Brand New. 1st edition. 400 pages. 9.02x6.26x1.10 inches. In Stock.

  • Language: English

    Published by Jenny Stanford Publishing, 2012

    9814316296 / 9789814316293

    • Hardcover

    Seller: GreatBookPricesUK, Woodford Green, United KingdomGreatBookPricesUK

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    Condition: New

    US$ 183.30

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  • Language: English

    Published by Pan Stanford Publishing Pte Ltd Nov 2012, 2012

    9814316296 / 9789814316293

    • Hardcover

    Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH

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    Condition: New

    US$ 219.95

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    Buch. Condition: Neu. Neuware - This book contains comprehensive reviews of different technologies to harness lattice mismatch in semiconductor heterostructures and their applications in electronic and optoelectronic devices. While the book is a bit focused on metamorphic epitaxial growth, it also includes other methods like compliant substrate, selective area growth, wafer bonding, heterostructure nanowires, and more. Basic knowledge on dislocations in semiconductors and innovative methods to eliminate threading dislocations are provided, and successful device applications are reviewed. It covers a variety of important semiconductor materials like SiGe, III-V including GaN and nano-wires; epitaxial methods like molecular beam epitaxy and metal organic vapor phase epitaxy; and devices like transistors and lasers etc.…