Published by VDM Verlag Dr. Müller, 2008
ISBN 10: 363903564X ISBN 13: 9783639035643
Language: English
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Published by VDM Verlag Dr. Müller, 2008
ISBN 10: 363903564X ISBN 13: 9783639035643
Language: English
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Published by VDM Verlag Dr. Müller, 2008
ISBN 10: 363903564X ISBN 13: 9783639035643
Language: English
Seller: Ria Christie Collections, Uxbridge, United Kingdom
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Published by VDM Verlag Dr. M�ller 2008-12-03, 2008
ISBN 10: 363903564X ISBN 13: 9783639035643
Language: English
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Published by VDM Verlag Dr. Müller, 2008
ISBN 10: 363903564X ISBN 13: 9783639035643
Language: English
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Published by VDM Verlag Dr. Müller, 2008
ISBN 10: 363903564X ISBN 13: 9783639035643
Language: English
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Add to basketTaschenbuch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This book provides a framework for real time controlof the Chemical Mechanical Planarization (CMP)process based on combining nonlinear dynamicsprinciples with statistical process monitoringapproaches. CMP has a directbearing on the computational speed and dimensionalcharacteristics of solid state devices. The challengein CMP may be narrowed to domains envelopingproductivity, measured in terms of material removalrate (MRR), and quality which is usually specified interms of surface roughness - Ra, within wafernon-uniformity (WIWNU), defect rate, etc. In thiswork, experimental investigations of CMP are executedwith the aid of sensors. The analysis of the datareveals the presence of pronounced stochastic-dynamiccharacteristics. As a result, we derive a processcontrol method integrating statistical time seriesanalysis and nonlinear dynamics which captures ~ 80%(linear R-sq) of the variation in MRR. In this mannera novel paradigm for effective process control in CMPhas been presented.
Published by VDM Verlag Dr. Müller, 2008
ISBN 10: 363903564X ISBN 13: 9783639035643
Language: English
Seller: moluna, Greven, Germany
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Add to basketCondition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. This book provides a framework for real time controlof the Chemical Mechanical Planarization (CMP)process based on combining nonlinear dynamicsprinciples with statistical process monitoringapproaches. CMP has a directbearing on.