Quantitative Radiography: Film Model Calibration and Dopant/Impurity Measurement in ICF Ablators; GA-A25659

Huang, H., and Stephens, R. B., and Nikroo, A., and Eddinger, S. A., and Chen, K. C., and Xu, H. W>, and Moreno, K. A., and Youngblood, K. P., and Skelton, M.

Published by General Atomics, San Diego, CA, 2007

About this Item

[2], 9, [1] pages. Illustrations. References. This is a preprint of a paper presented at the 17th Target Fabrication Specialist Meeting, San Diego, California on October 1-5, 2006 and to be published in Fusion Science and Technology. This is part of General Atomics Project 30272. General Atomics is an American energy and defense corporation headquartered in San Diego, California, specializing in research and technology development. This includes physics research in support of nuclear fission and nuclear fusion energy. The company also provides research and manufacturing services for remotely operated surveillance aircraft, including the Predator drones; airborne sensors; and advanced electric, electronic, wireless, and laser technologies. n ablator shell fabrication, trace elements and impurities are introduced in the deposition and the pyrolysis process, which must be controlled below a critical level. However, it is the opacity, not the individual elements, which matters in an Inertial Confinement Fusion (ICF) implosion. Radiography measures the opacity, allowing the accurate determination of the total impurity effect in a lump sum. Furthermore, by using the sputter target trace element information, we can determine the radial profile of oxygen to ±0.4 at. %. Oxygen is very difficult to measure by any other method, but is critically important for beryllium process development such as mandrel removal. To ensure measurement accuracy, we use a local standard to remove fluctuation in film developing and a step wedge to calibrate the film model. Presumed First Edition, First printing thus [Conference Preprint].

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Bibliographic Details

• Title: Quantitative Radiography: Film Model Calibration and Dopant/Impurity Measurement in ICF Ablators; GA-A25659
• Publisher: General Atomics, San Diego, CA
• Publication Date: 2007
• Binding: Wraps
• Edition: 1st Edition
• Condition: Very good