Fundamental Mechanisms of Low-Energy-Beam Modified Surface Growth and Processing: Volume 585 (MRS Proceedings) - Softcover

9781107414181: Fundamental Mechanisms of Low-Energy-Beam Modified Surface Growth and Processing: Volume 585 (MRS Proceedings)

Softcover

ISBN 10: 1107414180 ISBN 13: 9781107414181

Publisher: Cambridge University Press, 2014

Many technologically important thin-film growth, processing and surface modification techniques employ low-energy (hyperthermal and keV) particles. Energetic particle sources include ion beams (for growth and sputter etching), cluster beams, pulsed laser beams and plasmas. Phenomenological evidence suggests that the use of these energetic particles can change growth modes and provide control of surface morphology and film properties. The key to improving this control is to better understand how the energetic beams influence film, surface properties and the microscopic mechanisms responsible for beam-induced effects. This book addresses growth, ion erosion, surface smoothing, texturing and pattern formation, etching, structural stabilization and stress relaxation. Materials modification from the nanoscale to the mesoscale and macroscale are discussed as well as technological applications including thin-film transistors, microelectronics, materials for X-ray mirrors, high-temperature superconductors, sensors and diamond-like coatings. Papers on modeling and analysis of these processes using techniques including molecular dynamic simulations are also included..

"synopsis" may belong to another edition of this title.