Synopsis
Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, and identify key issues for future research in this field. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.
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Book Description
The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.
"About this title" may belong to another edition of this title.
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DOPING ENGINEERING FOR FRONT-END PROCESSING: VOLUME 1070
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Doping Engineering for Front-end Processing : Symposium Held March 25-27, 2008, San Francisco, California, U.s.a
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Doping Engineering for Front-end Processing: Symposium Held March 25-27, 2008, San Francisco, California, U.s.a: Vol 1070
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