Handbook of Advanced Plasma Processing Techniques

3 avg rating
( 1 ratings by Goodreads )
 
9783540667728: Handbook of Advanced Plasma Processing Techniques

Pattern transfer by dry etching and plasma-enhanced chemical vapor de­ position are two of the cornerstone techniques for modern integrated cir­ cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen­ sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi­ als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

"synopsis" may belong to another edition of this title.

From the Back Cover:

This volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectronics. The use of plasmas for patterning on a submicron scale has enabled successive generations of continually smaller transistors, lasers, micromachines, sensors and magnetic read/write heads that have formed the basis of our information age. This volume is the first to give coverage to this broad area of topics in a detailed fashion, especially in the rapidly expanding fields of micro-mechanical machines, photomask fabrication, magnetic data storage and reactor modeling. It provides the reader with a broad array of topics, authored by the leading experts in the field.

"About this title" may belong to another edition of this title.

Buy New View Book
List Price: US$ 399.00
US$ 307.37

Convert Currency

Shipping: US$ 11.92
From United Kingdom to U.S.A.

Destination, Rates & Speeds

Add to Basket

Top Search Results from the AbeBooks Marketplace

1.

R. J. Shul
Published by Springer-Verlag Berlin and Heidelberg GmbH and Co. KG (2000)
ISBN 10: 3540667725 ISBN 13: 9783540667728
New Quantity Available: > 20
Print on Demand
Seller:
Books2Anywhere
(Fairford, GLOS, United Kingdom)
Rating
[?]

Book Description Springer-Verlag Berlin and Heidelberg GmbH and Co. KG, 2000. HRD. Book Condition: New. New Book. Delivered from our US warehouse in 10 to 14 business days. THIS BOOK IS PRINTED ON DEMAND.Established seller since 2000. Bookseller Inventory # IP-9783540667728

More Information About This Seller | Ask Bookseller a Question

Buy New
US$ 307.37
Convert Currency

Add to Basket

Shipping: US$ 11.92
From United Kingdom to U.S.A.
Destination, Rates & Speeds

2.

Published by Springer (2000)
ISBN 10: 3540667725 ISBN 13: 9783540667728
New Hardcover Quantity Available: 15
Print on Demand
Seller:
Rating
[?]

Book Description Springer, 2000. Book Condition: New. This item is printed on demand for shipment within 3 working days. Bookseller Inventory # LP9783540667728

More Information About This Seller | Ask Bookseller a Question

Buy New
US$ 330.09
Convert Currency

Add to Basket

Shipping: US$ 3.51
From Germany to U.S.A.
Destination, Rates & Speeds

3.

R.J. SHUL
Published by Springer (2000)
ISBN 10: 3540667725 ISBN 13: 9783540667728
New Hardcover Quantity Available: 1
Seller:
Herb Tandree Philosophy Books
(Stroud, GLOS, United Kingdom)
Rating
[?]

Book Description Springer, 2000. Hardback. Book Condition: NEW. 9783540667728 This listing is a new book, a title currently in-print which we order directly and immediately from the publisher. Bookseller Inventory # HTANDREE0341975

More Information About This Seller | Ask Bookseller a Question

Buy New
US$ 330.08
Convert Currency

Add to Basket

Shipping: US$ 10.59
From United Kingdom to U.S.A.
Destination, Rates & Speeds

4.

Shul, R. J.
Published by Springer (2016)
ISBN 10: 3540667725 ISBN 13: 9783540667728
New Paperback Quantity Available: 1
Print on Demand
Seller:
Ria Christie Collections
(Uxbridge, United Kingdom)
Rating
[?]

Book Description Springer, 2016. Paperback. Book Condition: New. PRINT ON DEMAND Book; New; Publication Year 2016; Not Signed; Fast Shipping from the UK. No. book. Bookseller Inventory # ria9783540667728_lsuk

More Information About This Seller | Ask Bookseller a Question

Buy New
US$ 365.88
Convert Currency

Add to Basket

Shipping: US$ 5.14
From United Kingdom to U.S.A.
Destination, Rates & Speeds

5.

Published by Springer (2017)
ISBN 10: 3540667725 ISBN 13: 9783540667728
New Hardcover Quantity Available: > 20
Print on Demand
Seller:
Murray Media
(North Miami Beach, FL, U.S.A.)
Rating
[?]

Book Description Springer, 2017. Hardcover. Book Condition: New. Never used! This item is printed on demand. Bookseller Inventory # 3540667725

More Information About This Seller | Ask Bookseller a Question

Buy New
US$ 372.34
Convert Currency

Add to Basket

Shipping: US$ 1.99
Within U.S.A.
Destination, Rates & Speeds

6.

R. J. Shul
Published by Springer-Verlag Berlin and Heidelberg GmbH and Co. KG (2000)
ISBN 10: 3540667725 ISBN 13: 9783540667728
New Quantity Available: > 20
Print on Demand
Seller:
Pbshop
(Wood Dale, IL, U.S.A.)
Rating
[?]

Book Description Springer-Verlag Berlin and Heidelberg GmbH and Co. KG, 2000. HRD. Book Condition: New. New Book.Shipped from US within 10 to 14 business days.THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000. Bookseller Inventory # IP-9783540667728

More Information About This Seller | Ask Bookseller a Question

Buy New
US$ 385.91
Convert Currency

Add to Basket

Shipping: US$ 3.99
Within U.S.A.
Destination, Rates & Speeds

7.

Published by Springer
ISBN 10: 3540667725 ISBN 13: 9783540667728
New Hardcover Quantity Available: 4
Seller:
Diafan Media
(Geneva, IL, U.S.A.)
Rating
[?]

Book Description Springer. Hardcover. Book Condition: New. 3540667725 New Condition *** Right Off the Shelf | Ships within 2 Business Days ~~~ Customer Service Is Our Top Priority! - Thank you for LOOKING :-). Bookseller Inventory # 2BOOK3P359949

More Information About This Seller | Ask Bookseller a Question

Buy New
US$ 444.45
Convert Currency

Add to Basket

Shipping: US$ 4.95
Within U.S.A.
Destination, Rates & Speeds

8.

R.J. Shul (Editor), S.J. Pearton (Editor)
Published by Springer (2000)
ISBN 10: 3540667725 ISBN 13: 9783540667728
New Hardcover Quantity Available: 1
Seller:
Ergodebooks
(RICHMOND, TX, U.S.A.)
Rating
[?]

Book Description Springer, 2000. Hardcover. Book Condition: New. 2000. Bookseller Inventory # DADAX3540667725

More Information About This Seller | Ask Bookseller a Question

Buy New
US$ 471.41
Convert Currency

Add to Basket

Shipping: US$ 4.99
Within U.S.A.
Destination, Rates & Speeds

9.

Published by Springer (2000)
ISBN 10: 3540667725 ISBN 13: 9783540667728
New Hardcover Quantity Available: 1
Seller:
Irish Booksellers
(Rumford, ME, U.S.A.)
Rating
[?]

Book Description Springer, 2000. Hardcover. Book Condition: New. book. Bookseller Inventory # M3540667725

More Information About This Seller | Ask Bookseller a Question

Buy New
US$ 523.93
Convert Currency

Add to Basket

Shipping: FREE
Within U.S.A.
Destination, Rates & Speeds

10.

Published by Springer-Verlag Berlin and Heidelberg GmbH Co. KG, Germany (2000)
ISBN 10: 3540667725 ISBN 13: 9783540667728
New Hardcover Quantity Available: > 20
Print on Demand
Seller:
The Book Depository EURO
(London, United Kingdom)
Rating
[?]

Book Description Springer-Verlag Berlin and Heidelberg GmbH Co. KG, Germany, 2000. Hardback. Book Condition: New. 2000 ed.. Language: English . Brand New Book ***** Print on Demand *****.Pattern transfer by dry etching and plasma-enhanced chemical vapor de- position are two of the cornerstone techniques for modern integrated cir- cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen- sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi- als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed trial-and-error approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved. Bookseller Inventory # APC9783540667728

More Information About This Seller | Ask Bookseller a Question

Buy New
US$ 543.05
Convert Currency

Add to Basket

Shipping: US$ 3.97
From United Kingdom to U.S.A.
Destination, Rates & Speeds

There are more copies of this book

View all search results for this book