Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System (SpringerBriefs in Applied Sciences and Technology) - Softcover
Synopsis
This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.
"synopsis" may belong to another edition of this title.
About the Author
Prof. Seiji Samukawa
Distinguished Professor in Tohoku University
Professor in Institute of Fluid Science,
Professor and Principal Investigator, WPI-AIMR in Tohoku University.
"About this title" may belong to another edition of this title.
Other Popular Editions of the Same Title
Search results for Feature Profile Evolution in Plasma Processing Using...
Stock Image
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System (SpringerBriefs in Applied Sciences and Technology)
Seller: BMV Bloor, Toronto, ON, Canada
Seller rating 5 out of 5 stars
Condition: Very Good. Used - Very Good. Seller Inventory # 211-a - 00027
Buy Used
US$ 15.00
US$ 9.99 shipping
Ships from Canada to U.S.A.
Ships from Canada to U.S.A.
Quantity: 1 available
Stock Image
Samukawa:Feature Profile Evolution in P (eng)
Print on DemandSeller: Brook Bookstore On Demand, Napoli, NA, Italy
Seller rating 4 out of 5 stars
Condition: new. Questo è un articolo print on demand. Seller Inventory # 07c7fcfb420474716b2a428b0b425024
Buy New
US$ 55.26
US$ 4.64 shipping
Ships from Italy to U.S.A.
Ships from Italy to U.S.A.
Quantity: Over 20 available
Stock Image
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System (SpringerBriefs in Applied Sciences and Technology)
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
Condition: New. In. Seller Inventory # ria9784431547945_new
Buy New
US$ 67.80
US$ 16.10 shipping
Ships from United Kingdom to U.S.A.
Ships from United Kingdom to U.S.A.
Quantity: Over 20 available
Seller Image
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
Published by
Springer Japan Feb 2014, 2014
ISBN 10: 4431547940
ISBN 13: 9784431547945
New
Taschenbuch
Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany
Seller rating 5 out of 5 stars
Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described. 52 pp. Englisch. Seller Inventory # 9784431547945
Buy New
US$ 63.95
US$ 26.70 shipping
Ships from Germany to U.S.A.
Ships from Germany to U.S.A.
Quantity: 2 available
Stock Image
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System (SpringerBriefs in Applied Sciences and Technology)
Seller: Revaluation Books, Exeter, United Kingdom
Seller rating 5 out of 5 stars
Paperback. Condition: Brand New. 2014 edition. 40 pages. 8.75x6.00x0.25 inches. In Stock. Seller Inventory # x-4431547940
Buy New
US$ 87.02
US$ 13.44 shipping
Ships from United Kingdom to U.S.A.
Ships from United Kingdom to U.S.A.
Quantity: 2 available
Seller Image
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
Seller: moluna, Greven, Germany
Seller rating 5 out of 5 stars
Condition: New. Seller Inventory # 5753145
Buy New
US$ 57.83
US$ 56.86 shipping
Ships from Germany to U.S.A.
Ships from Germany to U.S.A.
Quantity: Over 20 available
Seller Image
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
Published by
Springer, Springer Feb 2014, 2014
ISBN 10: 4431547940
ISBN 13: 9784431547945
New
Taschenbuch
Seller: buchversandmimpf2000, Emtmannsberg, BAYE, Germany
Seller rating 5 out of 5 stars
Taschenbuch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 52 pp. Englisch. Seller Inventory # 9784431547945
Buy New
US$ 63.95
US$ 69.64 shipping
Ships from Germany to U.S.A.
Ships from Germany to U.S.A.
Quantity: 1 available
Seller Image
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
Seller: AHA-BUCH GmbH, Einbeck, Germany
Seller rating 5 out of 5 stars
Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described. Seller Inventory # 9784431547945
Buy New
US$ 69.81
US$ 70.20 shipping
Ships from Germany to U.S.A.
Ships from Germany to U.S.A.
Quantity: 1 available