Hard blue covers, content is as new, ex library copy with usual stamps and labels, no pocket and no external markings, otherwise a fine copy, pp xiv,394. Text figures and diagrams throughout. Size: 16x24cm.

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Bibliographic Details

Title

Applications of Plasma Processes to VLSI Technology

Publisher

John Wiley & Sons, New York

Publication Date

1985

Language

English

ISBN 10

0471869600

ISBN 13

9780471869603

Binding

Hard Cover

Edition

First English Language Edition.

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About this title

Synopsis

Presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, this book provides considerable insight into Japan's technological effort in this important area of science. Focuses on research involving plasma deposition and dry etching. Considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.

Language Notes

Text: English, Japanese (translation)

"About this title" may belong to another edition of this title.

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