Applications of Plasma Processes to VLSI Technology

ISBN 10: 0471869600 / ISBN 13: 9780471869603

Published by Wiley-Interscience, 1985

About this Item

1985 hardcover no dj xlibrary copy withdrawn stamp on edge of pages/ in book clean text has age spots has book plate and card pocket 394 pages::: H-10.

Seller Inventory # 0611IZ6DHVJ

Bibliographic Details

• Title: Applications of Plasma Processes to VLSI Technology
• Publisher: Wiley-Interscience
• Publication Date: 1985
• Language: English
• ISBN 10: 0471869600
• ISBN 13: 9780471869603
• Binding: Hardcover
• Condition: Used: Acceptable

About this title

Synopsis

Presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, this book provides considerable insight into Japan's technological effort in this important area of science. Focuses on research involving plasma deposition and dry etching. Considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.

Language Notes

Text: English, Japanese (translation)