CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications

Language: English

Published by Cambridge University Press, 2009

1605111287 / 9781605111285

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Druck auf Anfrage Neuware - Printed after ordering - To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.

Seller Inventory # 9781605111285

Title
CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications
Author
Alexander A. Demkov
Publisher
Cambridge University Press
Publication year
2009
Condition
Neu
Binding
Buch
Language
English
ISBN 10
1605111287
ISBN 13
9781605111285
Item weight
440 grams
Dimensions
235x157x15 mm

AHA-BUCH GmbH

Einbeck, Germany

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