CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications

Alexander A. Demkov (u. a.)

ISBN 10: 1605111287 / ISBN 13: 9781605111285

Published by Cambridge University Press, 2016

About this Item

CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications | Alexander A. Demkov (u. a.) | Buch | Englisch | 2016 | Cambridge University Press | EAN 9781605111285 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld, gpsr[at]libri[dot]de | Anbieter: preigu Print on Demand.

Seller Inventory # 106525438

Bibliographic Details

• Title: CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications
• Publisher: Cambridge University Press
• Publication Date: 2016
• Language: English
• ISBN 10: 1605111287
• ISBN 13: 9781605111285
• Binding: Buch
• Condition: Neu
• Dimensions: 235W x 157H x 15D millimeters 235 millimeters width by 157 millimeters height by 15 millimeters depth
• Weight: 440 grams
• Seller catalogs:
  • Bücher

About this title

Synopsis

To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.