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Bibliographic Details

Title: Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology Series)
Publisher: Noyes Publications
Publication Date: 1987
Language: English
ISBN 10: 0815511361
ISBN 13: 9780815511366
Binding: hardcover
Condition: Very Good

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Synopsis

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

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