Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications

Sherman, Arthur

ISBN 10: 0815511361 ISBN 13: 9780815511366

Published by Noyes Pubns, (1987)., Parkdridge, New Jersey, U.S.A., 1987

Language: English

Condition: Used - Near fine Hardcover

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Original blue cloth. Previous owner's name in ink, Near Fine. No Dust Jacket.

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Bibliographic Details

Title

Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications

Publisher

Noyes Pubns, (1987)., Parkdridge, New Jersey, U.S.A.

Publication Date

1987

Language

English

ISBN 10

0815511361

ISBN 13

9780815511366

Binding

Hardcover

Edition

Second Printing

Condition

Near Fine

Seller catalogs

Technology

About this title

Synopsis

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

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