Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

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Bibliographic Details

Title: Glow Discharge Processes
Publisher: John Wiley and Sons Inc, US
Publication Date: 1980
Language: English
ISBN 10: 047107828X
ISBN 13: 9780471078289
Binding: Hardback
Condition: New
Weight: 848 grams

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Brian Chapman is the author of Glow Discharge Processes: Sputtering and Plasma Etching, published by Wiley.

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