New. Multiple copies available. Consists of 27 papers presented at the 1997 ACS Polymeric Materials conference, focusing on micro- and nanopatterning.

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Bibliographic Details

Title: Micro- and Nanopatterning Polymers (\Vol. 706) (ACS Symposium Ser., No. 706)
Publisher: Oxford University Press, Incorporated, New York, NY, U.S.A.
Publication Date: 1998
Language: English
ISBN 10: 0841235813
ISBN 13: 9780841235816
Binding: Hard Cover
Condition: New

About this title

Synopsis

Use of polymers is widespread in the electronics industry, both in manufacturing integrated circuits and as components in the completed devices. In addition to providing an update in conventional microlithography technology, Micro- and Nanopatterning Polymers describes new patterning techniques involving block copolymers, direct deposition of metal oxides and other materials, and image-wise chemical deposition. It illustrates the challenges and opportunities in designing ArF excimer laser resists in the next generation of lithographic technology. The book includes discussions of material design alternatives, acid generator chemistries, and acid diffusion mechanisms in chemically amplified resists, which have now replaced novolac/diazoquinone resists in device manufacturing. Providing insight into the most recent breakthroughs in nano-technology, this unique book is an important step in the development of integrated circuits.

About the Author

Hiroshi Ito, IBM Almaden Research Center. Omkaram Nalamasu, both at Bell Laboratories, Lucent Technologies.

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