Bhandari Harish (19 results)

Paperback. Condition: Good. No Jacket. Amado, Braulio (illustrator). Pages can have notes/highlighting. Spine may show signs of wear. ~ ThriftBooks: Read More, Spend Less.

Paperback. Condition: Fair. No Jacket. Amado, Braulio (illustrator). Readable copy. Pages may have considerable notes/highlighting. ~ ThriftBooks: Read More, Spend Less.

perfect. Condition: Fine. Amado, Braulio (illustrator). LIKE NEW!!! Has a red or black remainder mark on bottom/exterior edge of pages.

perfect. Condition: Very Good. Amado, Braulio (illustrator). Connecting readers with great books since 1972! Used books may not include companion materials, and may have some shelf wear or limited writing. We ship orders daily and Customer Service is our top priority!

Perfect Paperback. Condition: Very Good. Amado, Braulio (illustrator). Shipped within 24 hours from our UK warehouse. Clean, undamaged book with no damage to pages and minimal wear to the cover. Spine still tight, in very good condition. Remember if you are not happy, you are covered by our 100% money back guarantee.

Condition: Like New. Amado, Braulio (illustrator). Most items will be dispatched the same or the next working day. An apparently unread copy in perfect condition. Dust cover is intact with no nicks or tears. Spine has no signs of creasing. Pages are clean and not marred by notes or folds of any kind.

Paperback. Condition: New. Amado, Braulio (illustrator). For decades, LGBTQ travellers have congregated in predictable places: queer-friendly cities like New York and Berlin, or beach towns such as Mykonos and Fire Island. But as progress and visibility expand across the globe, so do queer people's travel options. Drawing on their own extensive travel experiences, as well as the perspectives of local DJs, artists, activists, drag performers, DIY historians, and long-time residents (many of them found through the biggest advantage gay travellers have over their straight counterparts: 'hookup' apps like Grindr and Scruff), the authors of Sassy Planet offer up the latest on what's hot in 40 cities around the world. Traveling in the US? Check out RuPaul's Drag Race star Alaska's recommendations for Pittsburgh, where she first got her start. Planning a trip to Japan? Read about the 300+ queer bars packed into Tokyo's Shinjuku neighbourhood. Even in countries where homosexuality is sanctioned, you'll read about emerging pockets of queer acceptance and culture. You'll also find the very latest info on where to go in major destinations, from the Por Detroit parties in Mexico City to new Brooklyn hot spots. The book features interviews with local celebs, best-of lists, and little- known hideaways all packaged with helpful insights, cool bits of regional culture, queer lore-and of course, plenty of sass to spare.

Condition: good. Amado, Braulio (illustrator). Befriedigend/Good: Durchschnittlich erhaltenes Buch bzw. Schutzumschlag mit Gebrauchsspuren, aber vollständigen Seiten. / Describes the average WORN book or dust jacket that has all the pages present.

Condition: New. Amado, Braulio (illustrator).

Condition: New. Amado, Braulio (illustrator).

Softcover. Condition: Near Fine in color wraps. Square 8vo., 223 pp. Illustrated.

Condition: Very good. Amado, Braulio (illustrator).

Taschenbuch. Condition: Neu. Hafnium Oxide And Hafnium Silicate For High-k Application | Characterization of Hafnium Based Oxide Thin Films Deposited by CVD & Plasma-CVD For High-k Application in Transistors | Harish Bhandari | Taschenbuch | 232 S. | Englisch | 2010 | LAP LAMBERT Academic Publishing | EAN 9783838333885 | Verantwortliche Person für die EU: BoD - Books on Demand, In de Tarpen 42, 22848 Norderstedt, info[at]bod[dot]de | Anbieter: preigu.

Taschenbuch. Condition: Neu. Neuware -Novel materials with high-dielectric(k) constants are rapidly gaining attention for their application as gate insulator for future MOS transistors. This book provides the basic principles underlying chemical vapor deposition (CVD) of hafnium oxide and hafnium silicate thin films for high-k application. In addition to the deposition fundamentals, the discussions in the book provide valuable insights to various chemical and physical characterization techniques that can be applied to thin films in general. This easy-to-understand and well- illustrated text is designed for both beginners as well as advanced researchers with a good introduction to the subject of high-k thin films.Books on Demand GmbH, Überseering 33, 22297 Hamburg 232 pp. Englisch.

Paperback. Condition: Brand New. 232 pages. 8.58x5.91x0.63 inches. In Stock.

Paperback. Condition: Brand New. 232 pages. 8.58x5.91x0.63 inches. In Stock.

Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Novel materials with high-dielectric(k) constants are rapidly gaining attention for their application as gate insulator for future MOS transistors. This book provides the basic principles underlying chemical vapor deposition (CVD) of hafnium oxide and hafnium silicate thin films for high-k application. In addition to the deposition fundamentals, the discussions in the book provide valuable insights to various chemical and physical characterization techniques that can be applied to thin films in general. This easy-to-understand and well- illustrated text is designed for both beginners as well as advanced researchers with a good introduction to the subject of high-k thin films. 232 pp. Englisch.

Kartoniert / Broschiert. Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Bhandari HarishHarish Bhandari received the Bachelors in Chemical Engineering (2000) from Bangalore University, India. He earned his M.S. and Ph.D. (2006) in Chemical Engineering at the University of Alabama. He is currently a Res.

Taschenbuch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Novel materials with high-dielectric(k) constants are rapidly gaining attention for their application as gate insulator for future MOS transistors. This book provides the basic principles underlying chemical vapor deposition (CVD) of hafnium oxide and hafnium silicate thin films for high-k application. In addition to the deposition fundamentals, the discussions in the book provide valuable insights to various chemical and physical characterization techniques that can be applied to thin films in general. This easy-to-understand and well- illustrated text is designed for both beginners as well as advanced researchers with a good introduction to the subject of high-k thin films.