US$ 3.71
Quantity: 1 available
Add to basketCondition: Bon. Ammareal reverse jusqu'à 15% du prix net de cet article à des organisations caritatives. ENGLISH DESCRIPTION Book Condition: Used, Good. Ammareal gives back up to 15% of this item's net price to charity organizations.
Condition: Good. First Edition. Nu de eerste piek van de coronacrisis achter de rug is, kijken we aan tegen een ravage. Alles lijkt ontwricht. Levens gingen verloren, ons doen en laten werd ingeperkt en de economie raakte in een paar weken in een vrije val. Veel Nederlanders kampen met grote onzekerheid en zorgen over hun werk, hun sociale leven, hun toekomst. Een eenvoudige weg terug naar hoe het was lijkt afgesneden. Anders is niet per se slechter. In dit boek maakt een aantal vooraanstaande denkers, deskundigen en bestuurders een voorlopige balans op. Vanuit hun eigen kennis en ervaring kijken zij terug en vooruit. Hoe heeft de crisis ons zo kunnen overvallen? Wat zijn de oorzaken? Wat leren we ervan? En vooral: hoe gaan we straks door? Na de quarantaine is een even noodzakelijke als urgente uitnodiging om verder te kijken. Om met elkaar na te denken over de lessen van de pandemie en over de wereld waarin wij willen gaan leven. 'Als je, zoals ik, elke dag bezig bent met crisisbestrijding is het van grote waarde om de snelkookpan even van het vuur te halen. Om tunnelvisie te voorkomen, andere perspectieven te overdenken en doorkijkjes naar de toekomst te hebben. Deze waardevolle bundel verruimt de horizon en helpt om ons voor te bereiden op het vervolg en op een eventuele nieuwe crisis.' - Pieter-Jaap Aalbersberg, Nationaal Co?rdinator Terrorismebestrijding en Veiligheid.
Condition: Bueno. : Este libro trata sobre la deposición por pulverización reactiva, abordando los fundamentos y aplicaciones de esta técnica en la ciencia de los materiales. Explora los procesos físicos y químicos involucrados en la creación de películas delgadas mediante la pulverización reactiva, ofreciendo una visión detallada para estudiantes y profesionales del campo. EAN: 9783642095368 Tipo: Libros Categoría: Ciencias|Tecnología Título: Reactive Sputter Deposition Autor: Diederik Depla| Stijn Mahieu Páginas: 590 Formato: tapa blanda.
Paperback. Condition: Good. Condition: Goed. Binding: Paperback. Description: Rug licht verkleurd verder prima boek. Lichte gebruik-/opslagsporen. Lichte verkleuring.
Taschenbuch. Condition: Neu. Sputtering onions | Diederik Depla | Taschenbuch | Englisch | Brave New Books | EAN 9789465315782 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.
Seller: Librería Alonso Quijano, Alcobendas, M, Spain
-() Destino. Encuadernación en tapa Blanda. Sagarra, Josep M. dePla, Josep. 23 cm. Cartas europeas : crónicas en El Sol, 1920-1928Tapa deslucida.Tapa ilustrada. Pags.350.Volúmenes. Libro usado.
Seller: Kloof Booksellers & Scientia Verlag, Amsterdam, Netherlands
Condition: very good. Den Haag : VUGA, 1995. Paperback. xii,321 pp. Proefschrift. Stempel. Condition : very good copy. Keywords : , bestuurskunde.
Seller: Untje.com, Roeselare, Belgium
Paperback. Condition: Fair. Dutch.
Seller: Ria Christie Collections, Uxbridge, United Kingdom
US$ 358.59
Quantity: Over 20 available
Add to basketCondition: New. In.
Condition: New.
Taschenbuch. Condition: Neu. Reactive Sputter Deposition | Diederik Depla (u. a.) | Taschenbuch | Springer Series in Materials Science | xviii | Englisch | 2010 | Springer | EAN 9783642095368 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.
Condition: As New. Unread book in perfect condition.
Language: English
Published by Springer Berlin Heidelberg, Springer Berlin Heidelberg, 2008
ISBN 10: 3540766626 ISBN 13: 9783540766629
Seller: AHA-BUCH GmbH, Einbeck, Germany
Buch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.
Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.
US$ 574.96
Quantity: 2 available
Add to basketHardcover. Condition: Brand New. 1st edition. 572 pages. 9.25x6.25x1.50 inches. In Stock.
Published by Jules De Meester (Rousselare), 1899
Seller: Untje.com, Roeselare, Belgium
Paperback. Condition: Poor. 1. Eigendomsmerk. Verkleuring. Ongeopend. Geplastificeerd; rafelige randen Dutch De nieuwe tijd was een weekschrift dat elke donderdag verscheen en actuele maatschappelijke, politieke en culturele onderwerpen behandelde. Het blad richtte zich tot een breed Nederlandstalig publiek en bood opiniërende bijdragen, nieuwsberichten en beschouwingen die de geest van het fin de siècle weerspiegelen. Als periodiek document vormt deze jaargang een waardevolle bron voor de studie van persgeschiedenis en publieke opinie in het laatnegentiende-eeuwse Vlaanderen. Twee onvolledige jaargangen. Het tijdschrift klaagt sociale wantoestanden aan en kaart de noodzaak van vakbonden, pensioenen en kindertoelagen aan. De encycliek ?Rerum Novarum? krijgt er ruime aandacht.
Soft cover. Condition: Fine. Language: Dutch. Three West Flemings Speech given by Arthur De Bruyne on the occasion of the IVth Commemoration of the Dead in Roeselare Softcover, 225 x 150 mm, 18 pages, very good condition, very rare [This description may have been translated by AI.] 0.
Published by Jules De Meester (Rousselare), 1899
Seller: Untje.com, Roeselare, Belgium
Hardcover. Condition: Fair. 1. Verkleuring. Dutch De nieuwe tijd was een weekschrift dat elke donderdag verscheen en in zijn vierde jaargang (1899?1900) actuele maatschappelijke, politieke en culturele onderwerpen behandelde. Het blad richtte zich tot een breed Nederlandstalig publiek en bood opiniërende bijdragen, nieuwsberichten en beschouwingen die de geest van het fin de siècle weerspiegelen. Als periodiek document vormt deze jaargang een waardevolle bron voor de studie van persgeschiedenis en publieke opinie in het laatnegentiende-eeuwse Vlaanderen. Het tijdschrift klaagt sociale wantoestanden aan en kaart de noodzaak van vakbonden, pensioenen en kindertoelagen aan. De encycliek ?Rerum Novarum? krijgt er ruime aandacht.
Published by Jules De Meester (Rousselare), 1896
Seller: Untje.com, Roeselare, Belgium
Hardcover. Condition: Fair. 1. Eigendomsmerk. Verkleuring. Aantekeningen in potlood en enkele in balpen Dutch De nieuwe tijd was een weekschrift dat elke donderdag verscheen. Er zijn 5 jaargangen (1896?1901). Het tijdschrift klaagt sociale wantoestanden aan en kaart de noodzaak van vakbonden, pensioenen en kindertoelagen aan. De encycliek ?Rerum Novarum? krijgt er ruime aandacht.
Language: English
Published by Mybestseller, Brave New Books Okt 2025, 2025
ISBN 10: 9465315788 ISBN 13: 9789465315782
Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany
Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Magnetron sputtering is a mature technique for the deposition of thin films, both at laboratory and industrial level. Conceptually, the technique is quite simple and the process can be summarized in a few lines. A gas discharge is ignited by the application of a high voltage between a cathode and an anode. To increase the ionization efficiency of the electrons emitted from the cathode, a magnetic field is generated by a set of magnets placed behind the cathode. The ions present in the plasma, bombard the cathode which results in the ejection or sputtering of atoms. These sputtered atoms condense on the vacuum chamber walls and on the substrate to form a thin film. Behind this apparent simplicity, a complex interplay between different physical and chemical processes is hidden. This is especially the case when a reactive gas is added to the discharge. This book does not discuss all these processes in detail but provides, through a series of images, an overview of them. The short description accompanying the image can serve as a starting point for a more in-depth study. 110 pp. Englisch.
Seller: AHA-BUCH GmbH, Einbeck, Germany
Taschenbuch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Magnetron sputtering is a mature technique for the deposition of thin films, both at laboratory and industrial level. Conceptually, the technique is quite simple and the process can be summarized in a few lines. A gas discharge is ignited by the application of a high voltage between a cathode and an anode. To increase the ionization efficiency of the electrons emitted from the cathode, a magnetic field is generated by a set of magnets placed behind the cathode. The ions present in the plasma, bombard the cathode which results in the ejection or sputtering of atoms. These sputtered atoms condense on the vacuum chamber walls and on the substrate to form a thin film. Behind this apparent simplicity, a complex interplay between different physical and chemical processes is hidden. This is especially the case when a reactive gas is added to the discharge. This book does not discuss all these processes in detail but provides, through a series of images, an overview of them. The short description accompanying the image can serve as a starting point for a more in-depth study.
Seller: Brook Bookstore On Demand, Napoli, NA, Italy
Condition: new. Questo è un articolo print on demand.
Seller: Brook Bookstore On Demand, Napoli, NA, Italy
Condition: new. Questo è un articolo print on demand.
Language: English
Published by Springer Berlin Heidelberg, 2008
ISBN 10: 3540766626 ISBN 13: 9783540766629
Seller: moluna, Greven, Germany
US$ 346.58
Quantity: Over 20 available
Add to basketCondition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Covers all the sputtering techniques for thin-film depositionDescribes the physical basics and related technical realizationGives advice on controlling the sputter process and quality of the layers producedValuable reference work for.
Language: English
Published by Springer Berlin Heidelberg, 2010
ISBN 10: 3642095364 ISBN 13: 9783642095368
Seller: moluna, Greven, Germany
US$ 346.58
Quantity: Over 20 available
Add to basketCondition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Covers all the sputtering techniques for thin-film depositionDescribes the physical basics and related technical realizationGives advice on controlling the sputter process and quality of the layers producedValuable reference work for.
Language: English
Published by Springer Berlin Heidelberg, Springer Berlin Heidelberg Nov 2010, 2010
ISBN 10: 3642095364 ISBN 13: 9783642095368
Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany
Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge. 592 pp. Englisch.
Language: English
Published by Springer Berlin Heidelberg, Springer Berlin Heidelberg Apr 2008, 2008
ISBN 10: 3540766626 ISBN 13: 9783540766629
Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany
Buch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge. 592 pp. Englisch.
Language: English
Published by Springer Berlin Heidelberg, Springer Berlin Heidelberg Nov 2010, 2010
ISBN 10: 3642095364 ISBN 13: 9783642095368
Seller: buchversandmimpf2000, Emtmannsberg, BAYE, Germany
Taschenbuch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 592 pp. Englisch.
Language: English
Published by Springer Berlin Heidelberg, Springer Berlin Heidelberg Apr 2008, 2008
ISBN 10: 3540766626 ISBN 13: 9783540766629
Seller: buchversandmimpf2000, Emtmannsberg, BAYE, Germany
Buch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 592 pp. Englisch.
Seller: Books Puddle, New York, NY, U.S.A.
Condition: New. Print on Demand pp. 592.