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Geometry with an Introduction to Cosmic Topology
Language: English
Published by CreateSpace Independent Publishing Platform, 2018
ISBN 10: 1717134815 ISBN 13: 9781717134813
Seller: WorldofBooks, Goring-By-Sea, WS, United Kingdom
Seller rating 5 out of 5 stars
Paperback. Condition: Very Good. The book has been read, but is in excellent condition. Pages are intact and not marred by notes or highlighting. The spine remains undamaged.
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Measurement of dissolved oxygen (Chemical analysis)
Seller: Booksavers of Virginia, Harrisonburg, VA, U.S.A.
Seller rating 5 out of 5 stars
hardcover. Condition: Good. Dust Jacket Condition: Good. Binding tight, pages unmarked except previous owner's name on front endsheet. Cover is very good. The DJ is good with slight bumping along the edges. Your purchase benefits the world-wide relief efforts of Mennonite Central Committee.
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Chemical Vapour Deposition: Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Condition: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
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Chemical Vapour Deposition: Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Condition: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
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Hardcover. Condition: Very Good. Dust Jacket Condition: Good. Hardback in very good + condition with good + condition dust jacket.
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Hardcover. Condition: new. New Copy. Customer Service Guaranteed.
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Geometry with an Introduction to Cosmic Topology
Language: English
Published by CreateSpace Independent Publishing Platform, 2018
ISBN 10: 1717134815 ISBN 13: 9781717134813
US$ 14.16
US$ 13.50 shipping
Ships from United Kingdom to U.S.A.Quantity: 1 available
Add to basketPaperback. Condition: Brand New. 275 pages. 9.00x6.00x0.62 inches. This item is printed on demand.
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Chemical Vapour Deposition: Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Condition: New. Brand New Original US Edition. Customer service! Satisfaction Guaranteed.
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Chemical Vapour Deposition: Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Condition: New. Brand New Original US Edition. Customer service! Satisfaction Guaranteed.
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Chemical Vapour Deposition
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Condition: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
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Chemical Vapour Deposition: Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Condition: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
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Chemical Vapour Deposition: Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Condition: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
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CHEMICAL VAPOUR DEPOSITION
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Condition: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
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Condition: New.
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Ligand Field Theory and Its Applications
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
US$ 179.27
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Condition: new.
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Ligand Field Theory and Its Applications (Special Topics in Inorganic Chemistry)
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
US$ 194.60
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Ligand Field Theory and Its Applications
Language: English
Published by John Wiley and Sons Inc, US, 2000
ISBN 10: 0471317764 ISBN 13: 9780471317760
Seller: Rarewaves.com USA, London, LONDO, United Kingdom
Seller rating 5 out of 5 stars
US$ 236.47
Free Shipping
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Add to basketHardback. Condition: New. Die langerwartete aktualisierte Neuauflage des bewährten Klassikers! Seit dem Erscheinen der ersten Auflage ist das Gebiet der Ligandenfeldtheorie förmlich explodiert; inzwischen weiß man auch, wie, warum und unter welchen Voraussetzungen sich die theoretischen Erkenntnisse auf die Praxis übertragen lassen. Dieser einzige moderne Abriß der Ligandenfeldtheorie erläutert Methoden zur Erfassung der Bindungssituation in Übergangsmetallkomplexen sowie Anwendungen zur Interpretation struktureller, spektraler und magnetischer Eigenschaften. (01/00).
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US$ 230.51
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Add to basketCondition: New. pp. xviii + 354 Illus.
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Condition: New. pp. xviii + 354 1st Edition.
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Ligand Field Theory and Its Applications (Special Topics in Inorganic Chemistry)
Language: English
Published by Vch Verlagsgesellschaft Mbh, 1999
ISBN 10: 0471317764 ISBN 13: 9780471317760
US$ 277.41
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Ships from United Kingdom to U.S.A.Quantity: 2 available
Add to basketHardcover. Condition: Brand New. 1st edition. 354 pages. 9.75x6.75x1.00 inches. In Stock.
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Chemical Vapour Deposition
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Seller: PBShop.store UK, Fairford, GLOS, United Kingdom
Seller rating 4 out of 5 stars
US$ 296.53
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Ships from United Kingdom to U.S.A.Quantity: 6 available
Add to basketHRD. Condition: New. New Book. Shipped from UK. Established seller since 2000.
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Chemical Vapour Deposition
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
HRD. Condition: New. New Book. Shipped from UK. Established seller since 2000.
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Chemical Vapour Deposition : Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Condition: New.
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Chemical Vapour Deposition : Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
US$ 296.52
US$ 20.24 shipping
Ships from United Kingdom to U.S.A.Quantity: 11 available
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Ligand Field Theory and Its Applications
Language: English
Published by John Wiley and Sons Inc, US, 2000
ISBN 10: 0471317764 ISBN 13: 9780471317760
US$ 232.10
US$ 87.72 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketHardback. Condition: New. Die langerwartete aktualisierte Neuauflage des bewährten Klassikers! Seit dem Erscheinen der ersten Auflage ist das Gebiet der Ligandenfeldtheorie förmlich explodiert; inzwischen weiß man auch, wie, warum und unter welchen Voraussetzungen sich die theoretischen Erkenntnisse auf die Praxis übertragen lassen. Dieser einzige moderne Abriß der Ligandenfeldtheorie erläutert Methoden zur Erfassung der Bindungssituation in Übergangsmetallkomplexen sowie Anwendungen zur Interpretation struktureller, spektraler und magnetischer Eigenschaften. (01/00).
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Chemical Vapour Deposition : Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Condition: As New. Unread book in perfect condition.
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Chemical Vapour Deposition: Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
US$ 326.78
US$ 16.17 shipping
Ships from United Kingdom to U.S.A.Quantity: 9 available
Add to basketCondition: New. In.
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Chemical Vapour Deposition : Precursors, Processes and Applications
Language: English
Published by Royal Society of Chemistry, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
US$ 323.26
US$ 20.24 shipping
Ships from United Kingdom to U.S.A.Quantity: 11 available
Add to basketCondition: As New. Unread book in perfect condition.
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Chemical Vapour Deposition
Language: English
Published by Royal Society of Chemistry, GB, 2008
ISBN 10: 0854044655 ISBN 13: 9780854044658
Seller: Rarewaves.com USA, London, LONDO, United Kingdom
Seller rating 5 out of 5 stars
Hardback. Condition: New. Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from these different research areas. The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few chapters. Then follows a detailed description of the use of a variety CVD techniques to deposit a wide range of materials, including semiconductors, metals, metal oxides and nitrides, protective coatings and functional coatings on glass. Finally and uniquely, for a technical volume, industrial and commercial aspects of CVD are also discussed together with possible future trends, which is an unusual, but very important aspect of the book. The book has been written with CVD practitioners in mind, such as the chemist who wishes to learn more about CVD processes, or the CVD technologist who wishes to gain an increased knowledge of precursor chemistry. The volume will prove particularly useful to those who have recently entered the field, and it will also make a valuable contribution to chemistry and materials science lecture courses at undergraduate and postgraduate level.
