Ker Wei Su (26 results)

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  • Language: English

    Published by Springer, 1998

    0792382722 / 9780792382720

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    hardcover. Condition: Hardcover. Hardcover. modest shelf-wear. Free of any markings and no writings inside.

  • Language: English

    Published by Springer, 2013

    1475728247 / 9781475728248

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  • Language: English

    Published by Kluwer Academic Publishers, Boston, 1998

    0792382722 / 9780792382720

    • Hardcover

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    hardcover. Condition: Very Good. No Dust Jacket. Name from previous owner on FEP. Binding is very well preserved, though with minor instances of light surface wear, and a small dent on middle of spine (that does not impact function or cause tearing). Pages are clean and crisp, and printing is tight, clean and bright throughout. No dust jacket. MB. Used.

  • Language: English

    Published by Springer, 1998

    0792382722 / 9780792382720

    • Hardcover

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    Hardcover Sep 30, 1998. Condition: Used: Very Good. Cmos Vlsi Engineering: Silicon-On-Insulator (Soi) | Kuo/Ker-Wei Su | Kluwer Academic Publishers, 1998, in-8 cartonnage éditeur, 422 pages. Couverture propre. Dos solide. Intérieur frais. Exemplaire de bibliothèque : petit code barre en pied de 1re de couv., cotation au dos, rares et discrets petits tampons à l'intérieur de l'ouvrage. Bel état ! [BT15+].

  • Language: English

    Published by Springer US, 1998

    0792382722 / 9780792382720

    • Hardcover

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    Condition: Gut. Zustand: Gut | Seiten: 468 | Sprache: Englisch | Produktart: Bücher | Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications. CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs. CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics.

  • Language: English

    Published by Springer, 2010

    1441950575 / 9781441950574

    • Softcover

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  • Language: English

    Published by Springer, 1998

    0792382722 / 9780792382720

    • Hardcover

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  • Language: English

    Published by Springer, 1998

    0792382722 / 9780792382720

    • Hardcover

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  • Language: English

    Published by Springer, 1998

    0792382722 / 9780792382720

    • Hardcover

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    Language: English

    Published by Springer US, 2010

    1441950575 / 9781441950574

    • Softcover

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    Taschenbuch. Condition: Neu. CMOS VLSI Engineering | Silicon-on-Insulator (SOI) | Ker-Wei Su (u. a.) | Taschenbuch | xxxvi | Englisch | 2010 | Springer US | EAN 9781441950574 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.

  • Language: English

    Published by Kluwer Academic Publishers, 1998

    0792382722 / 9780792382720

    • Hardcover

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    Condition: New. Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. This book addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Num Pages: 422 pages, biography. BIC Classification: TJFC; UY. Category: (P) Professional & Vocational. Dimension: 235 x 155 x 25. Weight in Grams: 829. . 1998. Hardback. . . . .

  • Language: English

    Published by Springer US, Springer US, 2010

    1441950575 / 9781441950574

    • Softcover

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    Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications. CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs. CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics.

  • Language: English

    Published by Kluwer Academic Publishers, 1998

    0792382722 / 9780792382720

    • Hardcover

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    Condition: New. Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. This book addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Num Pages: 422 pages, biography. BIC Classification: TJFC; UY. Category: (P) Professional & Vocational. Dimension: 235 x 155 x 25. Weight in Grams: 829. . 1998. Hardback. . . . . Books ship from the US and Ireland.

  • Language: English

    Published by Springer, 1998

    0792382722 / 9780792382720

    • Hardcover

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  • Language: English

    Published by Springer, 1998

    0792382722 / 9780792382720

    • Hardcover

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    Hardcover. Condition: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

  • Language: English

    Published by Springer, 1998

    0792382722 / 9780792382720

    • Hardcover

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  • Language: English

    Published by Springer Nature B.V., 2013

    1475728247 / 9781475728248

    • Softcover
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    PAP. Condition: New. New Book. Shipped from UK. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.

  • Language: English

    Published by Springer Nature B.V., 2013

    1475728247 / 9781475728248

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    PAP. Condition: New. New Book. Delivered from our UK warehouse in 4 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.

  • Language: English

    Published by Springer US Sep 1998, 1998

    0792382722 / 9780792382720

    • Hardcover
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    Buch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications. CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs. CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics. 468 pp. Englisch.

  • Language: English

    Published by Springer US Dez 2010, 2010

    1441950575 / 9781441950574

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    Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications. CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs. CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics. 464 pp. Englisch.

  • Language: English

    Published by Springer US, 2010

    1441950575 / 9781441950574

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    Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and r.

  • Language: English

    Published by Springer US, 1998

    0792382722 / 9780792382720

    • Hardcover
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    Gebunden. Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and r.

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    Language: English

    Published by Springer US, 1998

    0792382722 / 9780792382720

    • Hardcover
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    Buch. Condition: Neu. CMOS VLSI Engineering | Silicon-on-Insulator (SOI) | Ker-Wei Su (u. a.) | Buch | xxxvi | Englisch | 1998 | Springer US | EAN 9780792382720 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand.

  • Language: English

    Published by Springer US, Springer US Sep 1998, 1998

    0792382722 / 9780792382720

    • Hardcover
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    Buch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications.CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs.CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics.Libri GmbH, Europaallee 1, 36244 Bad Hersfeld 468 pp. Englisch.

  • Language: English

    Published by Springer US, Springer US Dez 2010, 2010

    1441950575 / 9781441950574

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    Taschenbuch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications. CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs. CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 464 pp. Englisch.

  • Language: English

    Published by Humana, 1998

    0792382722 / 9780792382720

    • Hardcover
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    Buch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications. CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs. CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics.