Isbn: 9781441923073 - High-resolution X-ray Scattering: from Thin Films to Lateral Nanostructures (advanced Texts in Physics) (12 results)

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  • Language: English

    Published by Springer, 2011

    1441923071 / 9781441923073

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    Seller: Ria Christie Collections, Uxbridge, United KingdomRia Christie Collections

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  • Language: English

    Published by Springer, 2011

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  • Language: English

    Published by Springer 2011-12, 2011

    1441923071 / 9781441923073

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  • Language: English

    Published by Springer, 2011

    1441923071 / 9781441923073

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    Condition: New. pp. 428.

  • Language: English

    Published by Springer Verlag, 2011

    1441923071 / 9781441923073

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    Paperback. Condition: Brand New. 2nd edition. 410 pages. 9.00x6.00x1.00 inches. In Stock.

  • Language: English

    Published by Springer, 2011

    1441923071 / 9781441923073

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    Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.

  • Language: English

    Published by Springer, 2011

    1441923071 / 9781441923073

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  • Language: English

    Published by Springer New York Dez 2011, 2011

    1441923071 / 9781441923073

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    Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermanyBuchWeltWeit Ludwig Meier e.K.

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    Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers. 428 pp. Englisch.

  • Language: English

    Published by Springer New York, 2011

    1441923071 / 9781441923073

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    Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other.

  • Language: English

    Published by Springer, 2011

    1441923071 / 9781441923073

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    Seller: Majestic Books, Hounslow, United KingdomMajestic Books

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    Condition: New. Print on Demand pp. 428 241 Illus.

  • Language: English

    Published by Springer, 2011

    1441923071 / 9781441923073

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    Seller: Biblios, frankfurt am main, HESSE, GermanyBiblios

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    Condition: New. PRINT ON DEMAND pp. 428.

  • Language: English

    Published by Springer, Springer Dez 2011, 2011

    1441923071 / 9781441923073

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    Seller: buchversandmimpf2000, Emtmannsberg, BAYE, Germanybuchversandmimpf2000

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    Taschenbuch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 428 pp. Englisch.