Optical Microlithography (14 results)

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  • Language: English

    Published by SPIE Publications, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices

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  • Language: English

    Published by MP-SPI SPIE Press, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: PBShop.store UK, Fairford, GLOS, United KingdomPBShop.store UK

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    US$ 83.93

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    PAP. Condition: New. New Book. Shipped from UK. Established seller since 2000.

  • Language: English

    Published by SPIE Publications, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices

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  • Language: English

    Published by SPIE Press, US, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: Rarewaves.com USA, London, LONDO, United KingdomRarewaves.com USA

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    Paperback. Condition: New. illustrated Edition. Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.…

  • Language: English

    Published by SPIE Publications, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: Kennys Bookshop and Art Galleries Ltd., Galway, GY, IrelandKennys Bookshop and Art Galleries Ltd.

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    Condition: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective. Series: Tutorial Texts. Num Pages: 276 pages, Illustrations. BIC Classification: TJFC; TTB. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 253 x 181 x 18. Weight in Grams: 662. . 2005. illustrated edition. Paperback. . . . .…

  • Language: English

    Published by SPIE Publications, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: GreatBookPricesUK, Woodford Green, United KingdomGreatBookPricesUK

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  • Language: English

    Published by SPIE Publications, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: Kennys Bookstore, Olney, MD, U.S.A.Kennys Bookstore

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    Condition: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective. Series: Tutorial Texts. Num Pages: 276 pages, Illustrations. BIC Classification: TJFC; TTB. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 253 x 181 x 18. Weight in Grams: 662. . 2005. illustrated edition. Paperback. . . . . Books ship from the US and Ireland.…

  • Language: English

    Published by SPIE Press, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: THE SAINT BOOKSTORE, Southport, United KingdomTHE SAINT BOOKSTORE

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    Paperback / softback. Condition: New. New copy - Usually dispatched within 4 working days.

  • Language: English

    Published by SPIE Publications, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: GreatBookPricesUK, Woodford Green, United KingdomGreatBookPricesUK

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    Condition: Used - As new

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  • Language: English

    Published by Society of Photo Optical, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: Revaluation Books, Exeter, United KingdomRevaluation Books

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    US$ 98.70

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    Paperback. Condition: Brand New. illustrated edition. 276 pages. 9.75x6.75x0.50 inches. In Stock.

  • Language: English

    Published by SPIE Publications, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: Ria Christie Collections, Uxbridge, United KingdomRia Christie Collections

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    US$ 109.58

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    Condition: New. In English.

  • Language: English

    Published by SPIE Press, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: moluna, Greven, Germanymoluna

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    Einband - flex.(Paperback). Condition: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can .…

  • Language: English

    Published by SPIE Press Mär 2005, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH

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    Taschenbuch. Condition: Neu. Neuware.

  • Language: English

    Published by SPIE Press, US, 2005

    0819458295 / 9780819458292

    • Softcover

    Seller: Rarewaves.com UK, London, United KingdomRarewaves.com UK

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    Condition: New

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    Paperback. Condition: New. illustrated Edition. Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.…