Site Characterization Aggregation Implanted (14 results)

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  • Language: English

    Published by New York / London. Plenum Press., 1980

    0306402998 / 9780306402999

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    Seller: Antiquariat Löwenstein, Göllersdorf, NÖ, AustriaAntiquariat Löwenstein

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    pp. VIII. 520. Cloth. In good condition. Unfortunately, deliveries to the USA are not possible at this time.

  • Language: English

    Published by Springer, 2012

    1468410172 / 9781468410174

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  • Language: English

    Published by Springer, 2012

    1468410172 / 9781468410174

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    Seller: Ria Christie Collections, Uxbridge, United KingdomRia Christie Collections

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  • Language: English

    Published by Springer 2012-03, 2012

    1468410172 / 9781468410174

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  • Language: English

    Published by Springer, 2012

    1468410172 / 9781468410174

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    Condition: New. pp. 536.

  • Language: English

    Published by Springer US, Chapman And Hall/CRC, 2012

    1468410172 / 9781468410174

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    Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH

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    Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.

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    Cloth. Condition: Gut. 520 S. Ion implantation Congress Guter Zustand/ Good Ex-Library. With numerous ill.and figures. Cover faded at the edges and shows mild wear. ha1069803 Sprache: Englisch Gewicht in Gramm: 1060.

  • Language: English

    Published by Springer, 2012

    1468410172 / 9781468410174

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    Seller: Brook Bookstore On Demand, Napoli, NA, ItalyBrook Bookstore On Demand

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  • Language: English

    Published by Springer US, Chapman And Hall/CRC Mär 2012, 2012

    1468410172 / 9781468410174

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    Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermanyBuchWeltWeit Ludwig Meier e.K.

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    Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products. 536 pp. Englisch.

  • Language: English

    Published by Springer, 2012

    1468410172 / 9781468410174

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    Seller: Majestic Books, Hounslow, United KingdomMajestic Books

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    Condition: New. Print on Demand pp. 536 67:B&W 6.69 x 9.61 in or 244 x 170 mm (Pinched Crown) Perfect Bound on White w/Gloss Lam.

  • Language: English

    Published by Springer, 2012

    1468410172 / 9781468410174

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    Seller: Biblios, frankfurt am main, HESSE, GermanyBiblios

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    Condition: New. PRINT ON DEMAND pp. 536.

  • Language: English

    Published by Springer-Verlag New York Inc., 2012

    1468410172 / 9781468410174

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    Seller: THE SAINT BOOKSTORE, Southport, United KingdomTHE SAINT BOOKSTORE

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    Paperback / softback. Condition: New. This item is printed on demand. New copy - Usually dispatched within 5-9 working days.

  • Language: English

    Published by Springer US, 2012

    1468410172 / 9781468410174

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    Seller: moluna, Greven, Germanymoluna

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    Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the .

  • Language: English

    Published by Springer US, Chapman And Hall/CRC Mär 2012, 2012

    1468410172 / 9781468410174

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    Seller: buchversandmimpf2000, Emtmannsberg, BAYE, Germanybuchversandmimpf2000

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    Taschenbuch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 536 pp. Englisch.