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CMOS Gate-Stack Scaling ? Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Condition: New.
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Integration of functional oxides with semiconductors.
Book 13 of 68: SpringerBriefs in MaterialsLanguage: English
Published by New York/Heidelberg/Dordrecht, Springer., 2014
ISBN 10: 1461493196 ISBN 13: 9781461493198
Seller: Universitätsbuchhandlung Herta Hold GmbH, Berlin, Germany
Association Member: GIAQ ILAB VDA
Seller rating 4 out of 5 stars
24 cm. X, 278 p. Hardcover. Versand aus Deutschland / We dispatch from Germany via Air Mail. Einband bestoßen, daher Mängelexemplar gestempelt, sonst sehr guter Zustand. Imperfect copy due to slightly bumped cover, apart from this in very good condition. Stamped. Sprache: Englisch.
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CMOS Gate-Stack Scaling ? Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
US$ 41.11
US$ 16.00 shipping
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Cmos GateStack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press 2014-06-05, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
US$ 38.19
US$ 20.68 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketPaperback. Condition: New.
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Cmos GateStack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Seller: Kennys Bookshop and Art Galleries Ltd., Galway, GY, Ireland
Seller rating 5 out of 5 stars
Condition: New.
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Cmos Gate-Stack Scaling Materials, Interfaces and Reliability Implications
Language: English
Published by Cambridge University Press CUP, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Condition: New. pp. 194.
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Cmos GateStack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Condition: New.
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Condition: Muy bueno. : Este libro trata sobre la integración de óxidos funcionales con semiconductores. Cubre temas como los semiconductores de óxido metálico, la epitaxia y el recubrimiento de óxido. Publicado por Springer New York en 2016, el libro tiene 278 páginas y está escrito en inglés. EAN: 9781493941698 Tipo: Libros Categoría: Tecnología|Ciencias Título: Integration of Functional Oxides with Semiconductors Autor: Alexander A. Demkov| Agham B. Posadas Editorial: Springer New York Idioma: en Páginas: 278.
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Condition: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
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Condition: Used. pp. 290.
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Condition: Used. pp. 290 146 Illus. (113 Col.).
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Condition: Used. pp. 290.
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CMOS Gate-Stack Scaling Materials, Interfaces and Reliability Implications : Volume 1155
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.
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Cmos Gate-stack Scaling Materials, Interfaces and Reliability Implications : Symposium Held April 14-16, 2009, San Francisco, California, U.s.a.
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Condition: New.
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CMOS Gate-Stack Scaling ? Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Condition: New.
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Integration of Functional Oxides with Semiconductors (Springerbriefs in Materials)
Book 13 of 68: SpringerBriefs in MaterialsSeller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
US$ 133.24
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CMOS Gate-Stack Scaling ? Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
US$ 138.89
US$ 16.00 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketCondition: New. In.
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Cmos Gate-stack Scaling Materials, Interfaces and Reliability Implications : Symposium Held April 14-16, 2009, San Francisco, California, U.s.a.
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
US$ 138.87
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Integration of Functional Oxides with Semiconductors (Springerbriefs in Materials)
Book 13 of 68: SpringerBriefs in MaterialsUS$ 156.99
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Add to basketPaperback. Condition: Brand New. reprint edition. 288 pages. 9.25x6.10x0.68 inches. In Stock.
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Cmos Gate-stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Seller: Kennys Bookshop and Art Galleries Ltd., Galway, GY, Ireland
Seller rating 5 out of 5 stars
US$ 159.48
US$ 12.01 shipping
Ships from Ireland to U.S.A.Quantity: Over 20 available
Add to basketCondition: New. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. Editor(s): Demkov, Alexander A. (Freescale Semiconductor Inc., Austin, Texas); Taylor, Bill; Harris, H. Rusty; Butterbaugh, Jeffery W.; Rachmady, Willy. Series: MRS Proceedings. Num Pages: 194 pages, Illustrations. BIC Classification: TGM. Category: (U) Tertiary Education (US: College). Dimension: 228 x 152 x 13. Weight in Grams: 430. . 2009. Hardback. . . . .
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Integration of Functional Oxides with Semiconductors (Springerbriefs in Materials)
Book 13 of 68: SpringerBriefs in MaterialsUS$ 149.90
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Add to basketHardcover. Condition: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.
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Materials Fundamentals of Gate Dielectrics
Seller: Phatpocket Limited, Waltham Abbey, HERTS, United Kingdom
Seller rating 5 out of 5 stars
US$ 170.77
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Add to basketCondition: Good. Your purchase helps support Sri Lankan Children's Charity 'The Rainbow Centre'. Ex-library, so some stamps and wear, but in good overall condition. Our donations to The Rainbow Centre have helped provide an education and a safe haven to hundreds of children who live in appalling conditions.
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Taschenbuch. Condition: Neu. Integration of Functional Oxides with Semiconductors | Alexander A. Demkov (u. a.) | Taschenbuch | x | Englisch | 2016 | Springer | EAN 9781493941698 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.
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Cmos Gate-Stack Scaling-- Materials, Interfaces and Reliability Implications
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Condition: New. pp. viii + 179.
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US$ 180.45
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Add to basketHardcover. Condition: Brand New. 278 pages. 9.75x6.50x0.75 inches. In Stock.
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Cmos Gate-stack Scaling Materials, Interfaces and Reliability Implications: Symposium Held April 14-16, 2009, San Francisco, California, U.s.a.: Vol 1155
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
US$ 188.74
US$ 13.35 shipping
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Add to basketHardcover. Condition: Brand New. 194 pages. 9.13x6.30x0.79 inches. In Stock.
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Cmos Gate-stack Scaling Materials, Interfaces and Reliability Implications : Symposium Held April 14-16, 2009, San Francisco, California, U.s.a.
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
US$ 182.90
US$ 20.03 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
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Materials Fundamentals of Gate Dielectrics
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
US$ 189.57
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CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
US$ 171.91
US$ 33.38 shipping
Ships from United Kingdom to U.S.A.Quantity: 1 available
Add to basketHardcover. Condition: Like New. Like New. book.
